Used TEL / TOKYO ELECTRON UW-300Z #9204046 for sale
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ID: 9204046
Wafer Size: 12"
Vintage: 2004
Wet station, 12"
Main computer
Bath
SRM Tank
Temperature controller
Heater
Exhaust unit
FOUP Type 1: ENTEGRIS (AF3CWFAB20BUAFW)
FOUP Type 2: DAINICHI (SF300-02)
Wafer pitch: Half pitch
Arm
Wafer flow direction: Rear / Front
Number of wafers in process: (2) FOUP
(25) Slots FOUP
Chemical central supply
SD2 Dryer: Rinse and dry
Stocker: (12) FOUPs
Chemical:
HF
NH4OH
H2O2
HCL
IPA
O3W
Mainframe: Frame per and (2) Bath modules
Chemical bath: (4) Bath modules
Does not include CW and SD2
No factory mutual
External units:
Fire extinguisher
O3 Gas generator
No fluorescent lamp
Adjuster plate SS-304: 15 x 100 x 100 mm
Seismic bracing
Air operated valve
Display bath level sensor: Arm side and M/C
Outer panel material (C/S and SD2): SPCC
Chemical area panel material: Clear PVC
AMHS: OHT
No MMHS
FOUP ID Reader
On-line: GEM: SEMI E5 and E30
I/O Interface: HSMS to LAN (SEMI E37)
Signal tower: Front and maintenance area
CPU: PIII (600 MHz)
Operating system: Windows NT
Media: Floppy and zip
FOUP Station:
Load port:
(2) FOUP
FOUP Present sensor
Notch adjustment function
Shutter
Area sensor
KEYENCE BL601 FOUP ID Reader
FIMS Port (POD Opener):
Jump slot sensor
Wafer number and slot sensor
Carrier transfer: FOUP Check sensor
Stocker: (12) FOUPs
FFU
Location: Upper section LD / ULD (PTFE)
Course / Posture changer:
Pre-post changeover
Process number: 25 Wafers
LD / ULD:
Changes pre-post
Wafer hand turn function
Face to face function: (2) Carriers
Wafer hand material: PCTFE
Ionizer: 5024CE Controller
Other:
Direction access M/C media: Right side
Temporary wafer holder
Process modules:
Module 1: SPOM
Process temperature: 80°C~140°C
Heating method: KOMATSU AIH-64QS CS Heater
Bath material: Quartz
Module 2: QDR (Hot)
Process temperature: 70°C/20°C
No hot DIW gen
Central supply
Bath material: Quartz
No MEGASONIC
DIW Shower (Hot)
Module 3: SC1(M/S)
Process temperature: 30°C~70°C
Heating method: CS Heater with water jacket
Change mixing ration recipe
Bath material: PTFE
HORIBA CS-131 Concentration monitoring
KOKUSAI Alfa MEGASONIC, 2.4 kW
Module 4: POU
Process temperature: RT°C / Hot 70°C
No hot DIW Gen
Supplied
Bath material: Quartz
Chemical: HCL
SD2 (Rinse + dry)
Facilities:
CDA
N2
DIW
PCW
CM1: H2SO4
CM2: H2O2
CM3: NH4OH
CM4: HCL
CM5: IPA
Exhaust:
General
Solvent (SD2)
Acid (SD2, POU)
Alkali (POU, SC1)
Acid (SPOM, QDR)
Separate drains
AC Power:
EP1 (Normal): 208 VAC, 3 Phase, 125 A
EP2 (CVCF / UPS): 208 VAC, Single phase, 50 A
EP3 (CVCF): 120 VAC, 1 Phase, 5 A
2004 vintage.
TEL / TOKYO ELECTRON UW-300Z is a versatile wet station designed to provide high-end etching, cleaning, and chemical processes to almost any type of substrate. TEL UW300Z utilizes a heated internally heated 480-liter tank which is capable of temperatures ranging from 10 to 75 ℃. This powerful combination of controls provides the user with precise control over all functions of the wet station, optimizing the chemical process. A unique feature of TOKYO ELECTRON UW 300Z is an upper basket, which can be used to hold semiconductor wafers and other substrates to prevent them from touching each other or the walls of the vessel. This basket is designed to tilt and rotate, allowing the user to achieve better process results. UW-300Z can also be outfitted with multiple sizes of quartz or EPDMS spray nozzles, allowing users to apply chemicals with the greatest levels of accuracy. Multiple nozzles can be mounted in each tank, allowing users to create multiple and concurrent processes in different areas. With the addition of a circulation pump, the tank maintains a constant temperature and uniform chemical application. TOKYO ELECTRON UW 300 Z also features a unique safety system, including an automated emergency shutdown switch which is designed to immediately shut off the power in the event of an emergency. Additionally, all pipelines and valves are constructed from stainless steel, providing a corrosion-resistant and long-lasting system. Overall, UW 300Z provides superior performance in a wide range of chemical processes. Its high temperatures and tight control of chemicals provide users with an efficient and reliable system, while its strong construction and safety features guarantee long-term reliability and safety. With TEL UW 300 Z, anyone can easily create precise and optimal chemical processes.
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