Used TEL / TOKYO ELECTRON UW-300Z #9204046 for sale

ID: 9204046
Wafer Size: 12"
Vintage: 2004
Wet station, 12" Main computer Bath SRM Tank Temperature controller Heater Exhaust unit FOUP Type 1: ENTEGRIS (AF3CWFAB20BUAFW) FOUP Type 2: DAINICHI (SF300-02) Wafer pitch: Half pitch Arm Wafer flow direction: Rear / Front Number of wafers in process: (2) FOUP (25) Slots FOUP Chemical central supply SD2 Dryer: Rinse and dry Stocker: (12) FOUPs Chemical: HF NH4OH H2O2 HCL IPA O3W Mainframe: Frame per and (2) Bath modules Chemical bath: (4) Bath modules Does not include CW and SD2 No factory mutual External units: Fire extinguisher O3 Gas generator No fluorescent lamp Adjuster plate SS-304: 15 x 100 x 100 mm Seismic bracing Air operated valve Display bath level sensor: Arm side and M/C Outer panel material (C/S and SD2): SPCC Chemical area panel material: Clear PVC AMHS: OHT No MMHS FOUP ID Reader On-line: GEM: SEMI E5 and E30 I/O Interface: HSMS to LAN (SEMI E37) Signal tower: Front and maintenance area CPU: PIII (600 MHz) Operating system: Windows NT Media: Floppy and zip FOUP Station: Load port: (2) FOUP FOUP Present sensor Notch adjustment function Shutter Area sensor KEYENCE BL601 FOUP ID Reader FIMS Port (POD Opener): Jump slot sensor Wafer number and slot sensor Carrier transfer: FOUP Check sensor Stocker: (12) FOUPs FFU Location: Upper section LD / ULD (PTFE) Course / Posture changer: Pre-post changeover Process number: 25 Wafers LD / ULD: Changes pre-post Wafer hand turn function Face to face function: (2) Carriers Wafer hand material: PCTFE Ionizer: 5024CE Controller Other: Direction access M/C media: Right side Temporary wafer holder Process modules: Module 1: SPOM Process temperature: 80°C~140°C Heating method: KOMATSU AIH-64QS CS Heater Bath material: Quartz Module 2: QDR (Hot) Process temperature: 70°C/20°C No hot DIW gen Central supply Bath material: Quartz No MEGASONIC DIW Shower (Hot) Module 3: SC1(M/S) Process temperature: 30°C~70°C Heating method: CS Heater with water jacket Change mixing ration recipe Bath material: PTFE HORIBA CS-131 Concentration monitoring KOKUSAI Alfa MEGASONIC, 2.4 kW Module 4: POU Process temperature: RT°C / Hot 70°C No hot DIW Gen Supplied Bath material: Quartz Chemical: HCL SD2 (Rinse + dry) Facilities: CDA N2 DIW PCW CM1: H2SO4 CM2: H2O2 CM3: NH4OH CM4: HCL CM5: IPA Exhaust: General Solvent (SD2) Acid (SD2, POU) Alkali (POU, SC1) Acid (SPOM, QDR) Separate drains AC Power: EP1 (Normal): 208 VAC, 3 Phase, 125 A EP2 (CVCF / UPS): 208 VAC, Single phase, 50 A EP3 (CVCF): 120 VAC, 1 Phase, 5 A 2004 vintage.
TEL / TOKYO ELECTRON UW-300Z is a versatile wet station designed to provide high-end etching, cleaning, and chemical processes to almost any type of substrate. TEL UW300Z utilizes a heated internally heated 480-liter tank which is capable of temperatures ranging from 10 to 75 ℃. This powerful combination of controls provides the user with precise control over all functions of the wet station, optimizing the chemical process. A unique feature of TOKYO ELECTRON UW 300Z is an upper basket, which can be used to hold semiconductor wafers and other substrates to prevent them from touching each other or the walls of the vessel. This basket is designed to tilt and rotate, allowing the user to achieve better process results. UW-300Z can also be outfitted with multiple sizes of quartz or EPDMS spray nozzles, allowing users to apply chemicals with the greatest levels of accuracy. Multiple nozzles can be mounted in each tank, allowing users to create multiple and concurrent processes in different areas. With the addition of a circulation pump, the tank maintains a constant temperature and uniform chemical application. TOKYO ELECTRON UW 300 Z also features a unique safety system, including an automated emergency shutdown switch which is designed to immediately shut off the power in the event of an emergency. Additionally, all pipelines and valves are constructed from stainless steel, providing a corrosion-resistant and long-lasting system. Overall, UW 300Z provides superior performance in a wide range of chemical processes. Its high temperatures and tight control of chemicals provide users with an efficient and reliable system, while its strong construction and safety features guarantee long-term reliability and safety. With TEL UW 300 Z, anyone can easily create precise and optimal chemical processes.
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