Used TEL / TOKYO ELECTRON UW-300Z #9267289 for sale

TEL / TOKYO ELECTRON UW-300Z is a wet station that is suitable for a variety of semiconductor-related processes such as wafer cleaning, etching, and thin film deposition. It is compatible with both wet and dry types of processes, allowing for its use in applications ranging from shallow trench isolation (STI) to chemical-mechanical polishing (CMP). TEL UW300Z features an automated tool control system that allows for automated scheduling of tools and processes, as well as uniform chemistries across multiple tools. TOKYO ELECTRON UW 300Z housing is made of robust stainless steel, and the process chamber is a low-profile design that accommodates wafers up to 300mm in diameter. It also features an easy-to-use, intuitive-style touchscreen display located on the front of the unit, making it easy to operate the processes. TEL / TOKYO ELECTRON UW 300 Z also has built-in safety features, such as a safety light curtain on the housing that prevents operators from accessing the process chamber in order to protect them from hazardous chemicals or materials. In terms of process chemistries, UW 300Z can support various wet etch processes such as HF (hydrofluoric acid), NaOH (sodium hydroxide), and KOH (potassium hydroxide). The wet etch process can be used to clean the surface of a wafer and to pattern nanostructures onto its surface. Additionally, TEL UW 300Z can also be used to deposit thin films onto the surface of a wafer, such as aluminum films used in solar cells. For operator safety, TEL / TOKYO ELECTRON UW 300Z is equipped with an open-door interlock that prevents the operators from entering the process chamber while the wafer is in the lab. Additionally, TOKYO ELECTRON UW300Z also features an exhaust hood to ensure that contaminated air is properly expelled out of the lab environment. Furthermore, UW-300Z also includes an onboard particle-monitoring system that continuously monitors the particle level in the process chamber, allowing for real-time process monitoring. Overall, TOKYO ELECTRON UW 300 Z is an ideal wet station solution for semiconductor applications. It is lightweight yet robust in design, and it offers an automated tool control system with integrated safety features that keep operators safe in the lab. Additionally, TEL UW 300 Z is compatible with a variety of process chemistries and thin film deposition, making it an excellent choice for a variety of industrial and research applications.