Used WAFAB Wet bench #293671279 for sale

WAFAB Wet bench
Manufacturer
WAFAB
Model
Wet bench
ID: 293671279
Ni plating bench.
A WAFAB Wet bench is a type of wet station designed for use in the electronics industry. A Wet bench is a station equipped with apparatus required for processing substrate wafers in a cleanroom environment. A WAFAB Wet bench typically consists of a chemical cabinet, an exhaust stack, a sink station, and other equipment. The chemical cabinet provides a location to store and access chemicals used for semiconductor substrate etching. It is comprised of a frame for mounting shelves, a built-in light, adjustable feet, a gas cylinder bar, and locks for security. The shelves can support chemical containers and the gas cylinder bar secures gas cylinders in place. The exhaust stack is a three-way exhaust system that ensures the safe venting and removal of hazardous fumes or vaporized substances. The stack consists of a main duct that receives air and a blower that moves it through the filter, as well as two smaller ducts equipped with a fan to draw in fresh air and a sonic cleaner for cleaning the filter. The sink station consists of a work area, a pre-rinse sink, and a main drain. The work area of the sink station includes a sink with an incline to facilitate the draining of contaminated media, a draining table for mops, a faucet, and an air-control valve for the supply of hot and cold water. The pre-rinse sink has a faucet, a valve, and a safety shut off switch. The main drain is connected to the sink and contains a locking plug that can be opened and closed, and is also equipped with an air channel to ensure that hazardous atmospheres and vapors are saftely discharged. The other equipment typical to a Wet bench includes a vacuum filter, a glove box, a vacuum port, and a gas cylinder valves. The vacuum filter keeps air clean by removing particulates. The glove box provides a controlled environment for the transfer of parts from a cleanroom to a PVC pipe, or for the manipulation of sample substrates. The vacuum port services a vacuum chamber for substrate wafers, and the gas cylinder valves control the flow of gases into the system. In summary, a WAFAB wet station is a station designed for the semiconductor substrate etching process in a cleanroom environment. It includes a chemical cabinet to store and access etching chemicals; an exhaust stack for the safe removal of hazardous fumes or vaporized substances; a sink station with a work area; and a variety of other equipment including a vacuum filter, a glove box, a vacuum port, and gas cylinder valves.
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