Used KLA / TENCOR Archer 300 #9311042 for sale

KLA / TENCOR Archer 300 is a leading inspection equipment for the mask and wafer industries, featuring a high-resolution imaging system and an advanced microprocessors. It is designed to meet the requirements of today's fast-moving semiconductor manufacturing environment, providing a reliable solution for detection and correction of defects in wafer and mask pattern photolithography. The unit utilizes dual x-ray cameras and automated algorithms, allowing operators to detect and analyze pattern defects quickly and accurately. The Automated Finding and Characterization (AFaC) function of the machine scans the inspected wafer or mask for defects, and then communicates the resulting images to the user. The tool also features an intuitive user interface for optimal usability. The asset supports multiple wafer and mask sizes, and is capable of detecting a wide range of defects. It can inspect wafers up to 8-inch or 20 cm in diameter and masks up to 1,2 m in size. The model utilizes advanced 4K imaging and automated inspection algorithms to enable faster detection and analysis of defects. In order to ensure optimal performance, the equipment is designed to be highly robust and reliable. It has a modular design that allows for easy installation, maintenance and troubleshooting. It has robust diagnostic functions and advanced thermal compensation techniques to ensure outstandingly stable inspection and measurement of defects. Additionally, the user can customize the inspection parameters to ensure optimal performance for their application. KLA Archer 300 is ideal for inspecting mask and wafer pattern photolithography across different layers and processes. It is a reliable tool for ensuring production quality that meets customer demands efficiently and cost-effectively. With its industry-leading performance, dependability and features, this system is a great choice for semiconductor manufacturers.