Used RUDOLPH / AUGUST NSX 105 #293586627 for sale

RUDOLPH / AUGUST NSX 105 Mask & Wafer Inspection equipment is a comprehensive package for inspecting masks and engineered wafer products. It is capable of rapidly and accurately acquiring images of the defects which may exist on the surface of the substrates, and is accomplished through the use of an advanced image processing engine. The system is capable of detecting both opaque and transparent defects, ranging from 0.1 microns up to 400 microns. This is accomplished by using high-resolution color CCD cameras with both direct and planar microscopes that have been designed to provide high-resolution imaging. The improved imaging capabilities of AUGUST NSX-105 Mask & Wafer Inspection unit allow for the detection of both opaque and transparent defects, as well as optional features such as back-side imaging and defect mapping. Utilizing the mask table, the machine can perform scanning up to speeds of 600 wafers per hour and the direct microscopes provide the ability to detect features down to grade 0.15µm. Additionally, the tool uses the fastest optics possible to ensure that images are captured in the highest quality possible. Moreover, the asset is fully automated and runs through portable workstations. The user-friendly software enables quick and easy navigation with just a few clicks. The software's intuitive GUI displays images from the cameras and offers access to parameters such as zoom and brightness, enabling users to customize the model's performance to their specific application needs. The equipment also provides defect-counting software and statistical process control software to generate pass-fail reports quickly and accurately, saving time and costly errors. RUDOLPH NSX 105 Mask & Wafer Inspection system is a comprehensive inspection unit perfect for a wide range of mask and wafer manufacturing and engineering inspection requirements. With its intuitive GUI and comprehensive feature set, users can configure the machine quickly and easily according to their specific application requirements. As such, this tool offers manufacturers a reliable, efficient and cost-effective way of detecting and tracking defects on both masks and engineered substrates.