Used RUDOLPH / AUGUST NSX 105 #9230601 for sale

RUDOLPH / AUGUST NSX 105 Mask & Wafer Inspection Equipment is a comprehensive wafer and mask inspection system for use in the semiconductor fabrication industry. The unit is an integrated machine composed of an electrical charging station, direct-illumination (DI) illuminator, camera, computer, image processing software and peripheral equipment including a SDE microscope, sample stage and filtration tool. The Opto-electronic subsystem of the asset consists of the Polarizer-Analyzer Imaging Station (PAIS), DI illuminator, camera and SDE microscope. The illuminator has a wavelength range from 400 to 1050 nm, with a wide range of features including adaptive power control and adjustable light intensities, to ensure a high level of sensitivity and optimal performance. The camera is a high resolution CCD camera that captures images of the samples with up to 600 image frames per second. The SDE microscope (Scanning Diffraction Element) provides an optical resolution of up to 0.25 μm and a high-magnification image of the sample slice. The model has a highly advanced image capture and analysis software suite. It includes automatic and semi-automatic defect detection, analysis and classification, as well as comprehensive modules for wafer/mask inspection and analysis. The software also allows for a variety of operations such as mask inspection in planar or 3D images, surface inspection and metrology, photomask authentication, 3D inspection and defect detection. The peripheral equipment of AUGUST NSX-105 Mask & Wafer Inspection Equipment is designed for high accuracy. The sample stage is designed for precise positioning, with adjustable parameters for precise positioning and to achieve higher accuracy. The filtration system ensures a clean and precise inspection environment by removing small particles from the environment. The unit is designed to be reliable and precise, with an accuracy specification of up to 0.25 μm and maximum signal-to-noise ratio of 1000:1. It is also equipped with predictive maintenance, user-friendly touch screens, alarms and temperature control to ensure the highest performance and optimum operating temperature. RUDOLPH NSX 105 Mask & Wafer Inspection Machine is an all-in-one solution for mask and wafer inspection and analysis, providing precise and reliable performance in the semiconductor fabrication industry. This tool is suitable for high-end, high-precision processing and can be used to efficiently detect, classify and analyze defects in masks, semiconductor devices and other related materials.