Used RUDOLPH / AUGUST NSX 105 #9248108 for sale

RUDOLPH / AUGUST NSX 105 is a highly advanced and effective mask & wafer inspection equipment, designed for semi-conductor applications. Developed and released in 2014, this cutting-edge imaging system offers unparalleled accuracy and speed, making it an invaluable addition to any production line. AUGUST NSX-105 is driven by a powerful, highly efficient digital signal processing CPU, providing rapid image acquisition and on-board image processing for near real-time data output. Images are acquired and analyzed with a dual pixel detector pixel array, featuring a modified pixel structure for improved resolution and dynamic range. The unit can detect a wide range of features, from isolated points and mesh patterns to dark and bright images. The user controls and monitoring of RUDOLPH NSX 105 is supplied via an intuitive touchscreen interface. This allows operators to easily access and configure the inspection parameters and settings, as well as observe live images and review the data analysis results. On the operator side the unit has an extensive range of feature-rich software tools, including smart image optimization tools and a powerful artificial intelligence (AI) process engine, enabling full defect detection, analysis and reporting. In terms of physical attributes, RUDOLPH / AUGUST NSX 105 measures approx. 1250 mm x 1000 mm x 1450 mm and weighs around 645 kg. It boasts a trustworthy mechanical design, constructed from highly durable materials, and can cope easily with challenging production environments. It also comes with a force feedback controlled vision material handling (VMH) unit, which is capable of precise material positioning for enhanced image clarity and accuracy. To ensure reliable throughput and data accuracy RUDOLPH / AUGUST NSX-105 utilizes a wide array of advanced filtering techniques, providing exceptional image clarity. This ensures optimal image quality for feature size down to 0.35 um. Additionally, its enhanced interferometric lithography (EIL) technology enables more accurate imaging, enabling full defect detection and process control. This powerful mask & wafer inspection machine offers unprecedented performance, making it an ideal choice for semiconductor applications. The comprehensive list of features and advanced software tools make it a cost-effective and reliable choice for any production or inspection line.