Used RUDOLPH / AUGUST NSX 105 #9298761 for sale

RUDOLPH / AUGUST NSX 105 Mask & Wafer Inspection Equipment is an imaging inspection system that is used to examine wafer surfaces for irregularities and imperfections. This inspection unit can be used to detect contamination, thinning, pinholes, dislocations, defects, and other surface abnormalities. The machine utilizes a white light source, an optical camera, and an imaging pattern recognition algorithm to capture images and perform inspections. AUGUST NSX-105 consists of a darkfield illumination tool composed of a white LED light source and a cup-shaped darkfield mirror. The asset is also equipped with an Optical Camera and a laser that utilizes Interferometric Focus Scanning (IFS) to measure height and surface irregularities. The model also has a pattern recognition algorithm that is used to detect any irregularities in the wafer surface. Inspection images are taken with the Optical Camera at two angles and stored on the equipment's hard drive. The system also records the conditions under which the images were taken, such as the types of masks used, the type of light used, and the parameters of the pattern recognition algorithm. The recorded images are then analyzed by the unit's pattern recognition algorithm. This algorithm uses a template-based technique to detect any irregularities or imperfections on the wafer surface. The algorithm also uses a three-dimensional technique to measure the height of any irregularities. RUDOLPH NSX 105 is capable of automatically analyzing up to 1000 wafers with one run. The machine can be customized to the user's specific needs, and it can be used for a variety of defects, such as contamination, dislocations, pinholes, thinning, and other surface anomalies. NSX 105 Mask & Wafer Inspection Tool is an advanced tool for detecting, recognizing, and measuring surface irregularity and imperfection. This asset is easy to operate and is ideal for inspection and quality assurance of wafer surfaces.