Used RUDOLPH Waferview 320 #9223167 for sale
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ID: 9223167
Vintage: 2006
Macro defect inspection system
EFEM
Load port
2006 vintage.
RUDOLPH Waferview 320 is a state-of-the-art mask and wafer inspection equipment. It offers enhanced performance, improved accuracy, and the highest levels of reliability and productivity. The system uses a variety of advanced optical and imaging technologies to detect microscopic defects on both wafers and masks. Waferview 320 utilizes a two-dimensional fly-oversight inspection unit to detect feature and defect characteristics ranging from 10µl to sub-micron. It features two independent inspection stages, allowing for the simultaneous imaging and processing of defective mask and wafer features. The machine is capable of scanning fields of view up to 25 mm and its high-resolution optics are suited for both large and small features. An assortment of both mask and wafer image sensors can be integrated into RUDOLPH Waferview 320, from both CCD and CMOS devices. Waferview 320 has a number of built-in features to improve performance and productivity. For instance, the tool comes equipped with a real-time intelligence-driven image processor designed to spotting defects with maximum efficiency and accuracy. The asset also features auto-optimization capabilities that allow for adaptation and real-time optimization of image settings based on process objectives and changing conditions. RUDOLPH Waferview 320 comes with a user-friendly, intuitive interface, and the remote setting capability makes it simple to customize the inspection settings. In addition, the model has a wide range of connectivity options, including USB, Ethernet, GPIB, and others. This allows for easy integration with existing customer IT systems. Waferview 320 is designed to be a cost-effective solution for wafer and mask inspection. It offers the highest levels of productivity, accuracy, and reliability, making it an invaluable tool for today's electronics production. The equipment is fast and simple to use, with advanced features that make it an efficient, reliable, and cost-effective solution for wafer and mask inspection.
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