Used TEL / TOKYO ELECTRON Clean Track Mark 7 #293609900 for sale

ID: 293609900
Wafer Size: 8"
Vintage: 1996
System, 8" (2) Cores (3) Spinners 1996 vintage.
TEL / TOKYO ELECTRON Clean Track Mark 7 is a state-of-the-art photoresist equipment designed to apply a precise chemical etch to high performance semiconductor devices. The system uses a light-sensitive organic material to selectively remove a portion of the material from the device surface, creating photoresist patterns for subsequent deposition and structuring. This highly precise and consistent technique requires the use of specific chemicals, light sources and substrates, as well as advanced machine control systems for maximum reliability and performance. TEL Clean Track Mark 7 unit utilizes a vacuum chamber sputter process to apply a specialty coating on the semiconductor device's surface in order to provide an enhanced chemical etching response. The specialized photoresist is then spun onto the device before being exposed to a specific optical wavelength of light. This light must be evenly applied across the entire substrate surface in order to ensure uniformity during etching. During the exposure process, the light selectively etches away portions of the photoresist material to create the desired patterns. Once the exposure process is complete, the remaining photoresist and sputtered coating combination create a barrier to prevent unwanted etching in other areas of the device and ensure clean, uniform deposition. The entire etching process is completed in a special electroless bath which prevents potential electrical discharges or thermal damage to the structure. At the end of the process, devices can be patterned with unique features such as monitors, contacts, lines and other features essential for circuit designs. TOKYO ELECTRON Clean Track Mark 7's precision and consistency make it an invaluable tool for many advanced semiconductor fabrication techniques. In addition, the machine has the capability of providing superior protection against contaminants which may interfere with critical device features, leading to device failure or non-functionality. Furthermore, with its ability to create intricate photoresist patterns, Clean Track Mark 7 tool is also ideal for research and prototype applications.
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