Used TEL / TOKYO ELECTRON Clean Track Mark 7 for sale
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Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(2) Coater system, 8" Process: AL-CH, PIQ 1994 vintage.
126
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Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(1) Coater / (2) Developer system, 8" Silicon wafer Wafer flow: Right to left Single block Process s
134
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
Baking system, 8" Wafer flow: Right to left Silicon wafer Process-1: FC-9801 F NEC Controller Stage
148
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(1) Coater / (3) Developer system, 8" Process: i-Line develop unit Power transformer S2-93 Develope
142
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
System, 8" (2) Cores (3) Spinners 1996 vintage.
131
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(2) Coater system, 8" Wafer flow: Right to left Single block system TEL Clean Track Mark 7 Controlle
126
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
Resist coater / Developer system 1996 vintage.
165
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
Coater / Developers system, 6" System: Left to right for 8" wafer Indexer: 4 Cassette stage (Uni-Cas
175
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(1) Coater / (2) Developer system, 8" Wafer flow: Right to left Single block.
34
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(2) Developer systems, 8" Wafer flow: Left to right Single block.
33
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(2) Developer systems, 8" Wafer flow: Right to left Single block.
32
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(3) Developer systems, 8" Wafer flow: Left to right Single block.
32
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(3) Developer systems, 8" Wafer flow: Right to left Single block.
31
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(2) Coater / (2) Developer system, 8" Wafer flow: Right to left Single block.
66
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(2) Coater / (2) Developer systems, 8" Wafer flow: Left to right IFB Single block.
32
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(3) Coater system, 8" PIQ / Polyimide coater Single block.
27
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(1) Coater / (2) Developer system, 8" Single block Silicon wafer Wafer flow: Right to left Process s
114
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(5) Developer systems, 8" Dual blocks 2000 vintage.
132
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(5) Developer system, 8" Dual blocks 2001 vintage.
140
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(2) Coater system, 8" Blank / Reserve Single block.
131
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(3) Polyimide PIQ coater, 8" Single block.
148
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(3) Developer system, 8" Single block 2000-2001 vintage.
133
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(4) Developer system, 8" Single block 1999 vintage.
136
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
Coater / (2) Developer system, 8" Scrubber Single block Interface CANON Stepper Wafer flow: Left to
141
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
Coater / (2) Developer system, 8" Scrubber Interface CANON Stepper Wafer flow: Left to right Single
141
Popular Product
TEL / TOKYO ELECTRON
Clean Track Mark 7
(2) Coater / (3) Developer system, 8" Dual blocks Interface ASML Stepper Wafer flow: Right to left 1
140
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