Used TEL / TOKYO ELECTRON Clean Track Mark 7 #293746057 for sale
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ID: 293746057
Wafer Size: 8"
(2) Coater / (2) Developer systems, 8"
Wafer flow: Left to right
IFB
Single block.
TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment used in the nano-machining of electronic circuits and devices. The system uses a powerful UV light source to selectively illuminate a particular area of the substrate material. This exposed area is then coated with a layer of photoresist, which provides an insulating layer to protect underlying components and layers of the substrate from further exposure. The unit can then be used to etch away the exposed area of the photoresist layer to create the desired pattern for further processing. The Light Source on TEL Clean Track Mark 7 is a plasma-burned silicon carbide ceramic lamp that produces UV light with a spectral wavelength of about 365nm - 395nm. This allows for greater precision in the photolithography operation. The light source can be directed onto the substrate from various angles, allowing for greater control over the design process. The photolithography machine also includes a mask, which is placed between the substrate and the light source. It contains the pattern that is to be applied to the substrate material. The mask is an integral component of the tool and can be changed easily to allow for different patterns on different substrates. In addition to the Light Source and the Mask, TOKYO ELECTRON Clean Track Mark 7 photolithography asset also contains a software package which can be used to control the model and create the desired patterns. It also allows for real-time monitoring and feedback of the photolithography operation, making the process far more reliable and less prone to defects and errors. Clean Track Mark 7 is a powerful and sophisticated photoresist equipment that is used in the creation of complex electronic circuits and devices. Its powerful light source, ability to control the angle of exposure and ability to quickly and easily manipulate the mask helps to ensure precision and accuracy in the nano-machining process, allowing for the creation of very small and intricate designs. The software package also helps to guarantee that errors and defects are quickly identified and eliminated. In short, it is an indispensable tool for the nano-machining process.
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