Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9246548 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment which offers a wide range of options for imaging and processing. This machine provides an efficient platform for optical lithography and advanced patterning processes such as etching, deposition, and lift-off. The system uses a high-speed, multi-wavelength laser and superior mirror unit to create sharp, high-resolution images on semiconductor wafers. The machine is also equipped with a dynamic thermal stage that maintains precise control over substrate temperature, ensuring the highest quality of pattern resolution. The machine is designed to reduce defects and contamination, making it ideal for sensitive, high-resolution applications. It features an advanced filtration tool containing three separate units to remove particles, moisture, and airborne contamination. TEL Clean Track Mark 7 is also equipped with a state-of-the-art air-flow asset which isolates the process area from the chamber to prevent airborne contamination from entering the model. TOKYO ELECTRON Clean Track Mark 7 is capable of process a variety of materials, including silicon-on-insulator wafers (SOI) and silicon-on-sapphire wafers (SOS). Furthermore, the equipment features a wide range of deposition and lift-off options, including wet, dry, and laser deposition/lift-off processes. Finally, Clean Track Mark 7 is equipped with an advanced imaging system. The unit is capable of resolving patterns down to 0.5 micron, which is well suited for both DRAM and SRAM applications. Additionally, the machine can handle multiple layer transfers, ensuring a high level of accuracy and repeatability across different layers. In addition, the machine offers advanced alignment capabilities, allowing the user to precisely position different layers on the substrate. Overall, TEL / TOKYO ELECTRON Clean Track Mark 7 is a powerful and reliable photoresist tool for imaging and processing semiconductor wafers. It features high-resolution imaging capabilities, multiple deposition/lift-off options, advanced air-flow filtration, and excellent alignment capabilities. This machine is an ideal choice for a variety of imaging and processing applications.