Used TEL / TOKYO ELECTRON Clean Track Mark 7 #293819950 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 is an automated photoresist equipment designed for precision process, deposition, and etch work. The system features a high-speed laser scribe unit that allows for high-precision overlay alignment. The machine is equipped with a number of process-adjustable parameters, making it easy to adjust for different substrate types or process requirements. The photoresist can be delivered in thin film format for high-resolution patterning of small geometries. The tool utilizes an ultra-high frequency multi-beam laser source that generates a series of laser pulses to scribe patterns onto the substrate surface. The scribe marks are then used as alignment references for the photoresist deposition cycle. The asset is capable of precise control of substrate surface topography, enabling accurate positioning and registration of the photoresist over the embedded marks. The photoresist model can deposit photoresist material in thin film form onto a substrate surface. This precise thin-film deposition can enable high-resolution patterning of small geometries, ideal for semiconductor device manufacturing. The equipment is further equipped with an integrated camera for precise alignment of the laser beam for the scribing process. This camera is also used for real-time feedback during the deposition process, allowing for high-accuracy registration of the photoresist over the scribed marks. The photoresist system is designed for repeatability and throughput. The unit is capable of up to 2,000 photorecords per hour. This high throughput makes it ideal for applications where throughput is critical, such as large-scale production runs. TEL Clean Track Mark 7 machine is an ideal solution for the deposition of photoresist material over scribed substrates. The high-speed multi-beam laser source enables precise scribing and registration of the photoresist material. The integrated camera and automated process control tool enable high-accuracy patterning with minimal errors and fast cycle times. The asset is highly versatile, making it ideal for high-resolution patterning of small geometries with a variety of substrates and process requirements.