Used TEL / TOKYO ELECTRON Clean Track Mark 7 #293746064 for sale
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ID: 293746064
Wafer Size: 8"
(2) Developer systems, 8"
Wafer flow: Right to left
Single block.
TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment that is used to process surfaces. This system utilizes photoresist to create a uniform surface finish by removing unwanted material and enhancing texture. Photoresist is a chemical material that is sensitive to light, which can be applied to the surface to be processed. When exposed to light, the photoresist changes its structure and aids in the process of removing unwanted material. It is able to reliably remove the unwanted material due to its inherent chemical structure which enables it to bind to the material to be removed. TEL Clean Track Mark 7 is comprised of three elements: a light source, an irradiation stage, and a resist removal stage. The light source emits light with a specific wavelength which is optimally suited for photoresist applications. This light passes through the irradiation stage which positions the photoresist in such a way that it will be exposed to the light. Finally, the resist removal stage uses a combination of agitation and cleaning agents to effectively and efficiently remove the unwanted material from the surface. TOKYO ELECTRON Clean Track Mark 7 has a wide range of features that make it an ideal choice for photoresist processing. The unit is highly efficient and has the capability to process large areas rapidly. It has adjustable parameters so that materials of different thicknesses and densities can be effectively processed. The machine is also capable of maintaining a uniform surface structure and is able to produce highly-accurate results. Additionally, the light source has a WLCD tool that is able to recognize light source misalignment in order to ensure optimal exposure of and consistency of the photoresist. Overall, Clean Track Mark 7 is a reliable and efficient asset that is capable of producing quality surface finishes in a wide range of photoresist applications. Its safety design, adjustable parameters, and advanced light monitoring capabilities help to ensure that processes are accurate and efficient.
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