Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9250398 for sale
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ID: 9250398
Wafer Size: 8"
Vintage: 2001
(5) Developer system, 8"
Dual blocks
2001 vintage.
TEL / TOKYO ELECTRON Clean Track Mark 7 is an advanced photoresist system designed for use in a wide range of semiconductor fabrication processes. It is capable of processing large wafers, up to 200mm (approx 8 inches) in diameter at high speed and with great accuracy, a key factor in the development of modern semiconductor technology. At the heart of TEL Clean Track Mark 7 is its advanced laser lithography system, which uses a specialized, highly-focused laser beam to transfer a pattern from a photomask onto a photo-resist coated wafer. This laser beam is then guided by precision motion-control systems to ensure accuracy on the nanometer scale. Aperture control is also used to prevent light exposure to areas of the wafer that have not been previously exposed. TOKYO ELECTRON Clean Track Mark 7 is special because it can also process wafer substrates of different materials, such as silicon, gallium arsenide, and indium phosphide. This allows for more flexible solutions in the design of newer, more advanced semiconductor components. As well as being highly accurate and precise, this system also boasts of an excellent level of cleanliness, ensuring that all the dust, particles, and residues are thoroughly removed from the lithography stage. This is crucial in preventing contamination and preventing the introduction of defects into the semiconductor part. Finally, Clean Track Mark 7 has excellent compatibility with the most commonly used photoresist materials. This enables higher performance, faster operation, and a more efficient workflow, lowering costs and ensuring fewer mistakes in the production of high-tech semiconductor devices.
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