Used TEL / TOKYO ELECTRON Clean Track Mark 7 #293641936 for sale
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ID: 293641936
(1) Coater / (2) Developer system, 8"
Single block
Silicon wafer
Wafer flow: Right to left
Process station (PSB): Process block robotic arm (PRA)
ADH
(4) LHP
(3) CPL
FC-9801 F Controller
Stage: Cassette stage
Indexer: Open CSB
CRA
2-1 COT unit:
Resist dispense nozzle with HV pump
Side rinse nozzle
Dual back rinse nozzles
Photoresist temperature controller
Motor flange temperature controller
Direct gravity drain type
2-2 / 2-3 DEV unit:
Stream nozzle
Dual D.I top rinse nozzle
Dual back rinse nozzles
Motor flange temperature controller
Direct gravity drain type
Auto damper
Auto dummy dispenser
Chemical supply system:
Solvent supply for COT unit
Develop solution supply for (2) DEV units
Power transformer
SHINWA THC Temperature and humidity controller
Hard Disk Drive (HDD) included
(2) Circular pumps missing.
TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment designed for the fabrication of advanced microelectronic devices. This system features a high-precision beam focusing and alignment unit chamber, allowing workers to perform job-by-job processing at the atomic level. TEL Clean Track Mark 7 consists of two stages: an alignment chamber, and the substrate processing stage. The alignment chamber features a beam-deflection machine with two lenses that are used to align the beam and thus focus the light onto the exact spot on the substrate being processed. This ensures a highly accurate and repeatable result for each job. The substrate processing stage consists of a vacuum chamber filled with various gases to clean and remove hazardous particles and airborne contaminants that could potentially contaminate the substrate. TOKYO ELECTRON Clean Track Mark 7 is able to attain a resolution of 1µm with the help of the control software. This is adjustable and can be tuned to meet different processes. The tool also has a range of advanced features that can be used to adjust the focus, size, and shape of the beam. This enables the user to optimize the process in a very short amount of time and at very high accuracies. In addition, Clean Track Mark 7 asset employs a patent pending, innovative irradiation method that increases the signal intensity and signal homogeneity. This enhances the resolution of devices by reducing the surface imperfections and ensures a consistent high-quality wafer etch. The model also features a range of diagnostic tools such as the on-wafer etch test, photoresist cleaning test, E-beam simulation, automated recipe control, and much more. Overall, TEL / TOKYO ELECTRON Clean Track Mark 7 is an advanced photoresist equipment designed to provide the highest quality wafer etching and photomask processing. With its high resolution, control software, and variety of advanced features, workers can perform jobs requiring high precision reliably and accurately.
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