Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9196447 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 (CTM-7) is a photoresist equipment used in the fabrication and building processes of the semiconductor industry. It is used for a variety of applications, such as photolithography, wet and dry etching, and other photonic processes. The CTM-7 is designed for large, complex wafers with highly precise feature sizes of up to 0.25 micrometers. It has a high throughput rate and is highly efficient in comparison to other photoresist systems. The CTM-7 uses a combination indirect and direct laser projection optics to accurately position the photoresist layer onto the wafer substrate. The photoresist is held on an EPC roller by electrostatic force, allowing it to be precisely positioned with centering accuracy of +/- 1micron. The photoresist layer is dispensed by the high precision dispenser according to the pre-defined parameters for the job. Afterward, the laser beams at the photoresist layer to expose the underlying substrate. The exposed substrate is then etched to a defined depth according to job parameters. The CTM-7 also has an advanced vacuum handling system, which allows for optimal wafer alignment and handling of the wafer. After etch completion, the wafer is washed and rinsed in a dielectric bath before it is automatically loaded into the spin-dryer for drying. The spin-dryer provides improved cycle times and enhances the cleanliness of the wafer. The CTM-7 also comes with an automatic wafer inspection unit, which allows users to quickly and accurately inspect for any defects on the wafer surface. In addition, it is equipped with an advanced process monitoring machine, which uses image processing to monitor the process steps in real-time and automatically adjust parameters accordingly. This ensures that the photolithography, etching, and cleaning processes all take place at the optimal level of quality. In conclusion, TEL Clean Track Mark 7 is a reliable and efficient photoresist tool, that offers high performance and accuracy, as well as improved cycle times. Its advanced features, such as the vacuum handling asset and the process monitoring model, ensure that the process is completed to the highest standard of quality and precision.