Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9158020 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 is the newest generation of photoresist systems designed to meet the latest in semiconductor manufacturing and processing needs. This equipment offers advanced features which provide superior range of capability and performance. TEL Clean Track Mark 7 uses Direct-Drive Maskless Exposure (DME) technology which allows for better patterning on substrates such as photoresist layers. With this technology, the optics system exposes a substrate according to the Computer-Aided Design (CAD) data instead of using a photomask. This method eliminates the need for an additional clean room for making masks, saving time and money. TOKYO ELECTRON Clean Track Mark 7 also features Active Pattern Precision (APP) tuning capability. This capability allows for better patterning control on photoresist layers where the high resolution details, such as LWR (line width roughness) is most important. APP helps maintain LWR within 5nm, making it ideal for processes where the level of precision is a must. In addition to DME and APP, Clean Track Mark 7 includes a Substrate Movement unit. This allows for the substrate to be moved in the X, Y, and Z directions, and tilt direction for up to 30-degree offset. This machine allows for multiple substrate sizes and shapes, and all adjustments and alignment can be done quickly and accurately, saving time and money. TEL / TOKYO ELECTRON Clean Track Mark 7 also boasts a range of state-of-the-art cleaning features. This tool uses a patented Aerospray cleaning operation, which helps to reduce particle scattering while cleaning photoresist. It also offers a proprietary wet cleaning process utilizing a DI-like water, which helps to minimize surface corrosion due to strong chemicals. TEL Clean Track Mark 7 is also equipped with a pre-alignment asset which helps to maximize the accuracy of the alignment by measuring the length, width, and area of each die from the CAD source data. This model also helps to reduce the amount of manual labor required during the die placement and reduces the need for manual inspection and optimization. In summary, TOKYO ELECTRON Clean Track Mark 7 equipment provides the semiconductor industry's highest performance and most advanced features in photoresist systems. Its Direct-Drive Maskless Exposure technology, Active Pattern Precision tuning capability, Substrate Movement system, and range of cleaning features provide exceptional accuracy with rapid setup and operation.