Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9165478 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment that provides excellent performance for innovative lithography processes. It is designed for advanced mask fabrication, with a focus on high-volume production of various applications such as high-density LCD, flat-panel displays, semiconductor devices, and other advanced electronics manufacturing. TEL Clean Track Mark 7 provides lithography processing by using a wet track system, with an optimized photoresist patterning process for improved yields and throughput. It supports a wide range of substrate sizes and configurations, and can handle up to 120 substrates at once per hour. The unit is equipped with a high-precision laser focusing machine and delivers superior etch profiles with outstanding uniformity and accuracy. TOKYO ELECTRON Clean Track Mark 7 is equipped with a high-resolution mask aligner, allowing accurate interchange of masks and high-speed reticles, together with an advanced chemistry re-circulation tool that maintains low-residue levels for optimum results in photoresist applications. Its intelligent spray asset ensures consistent and optimized applied resist, while its advanced focus detection model achieves precise step coverage and superior pattern placement accuracy. The equipment is designed to ensure effective wafer cleaning, with automatic scrubbing and self-cleaning mechanisms for maintenance and extended product life. The system includes a built-in data exchange port that allows for real-time transfer of critical data between the unit, the control application, and various external hosts. This ensures reliable and efficient operation, as well as efficient process monitoring and control. Clean Track Mark 7 is compliant with numerous industry standards, allowing for easy integration into your facility's lithography environment. TEL / TOKYO ELECTRON Clean Track Mark 7 is a high-performance photoresist machine that is designed to meet the demands of advanced electronics production. It provides accurate and reliable patterning results with excellent uniformity, throughput, and step coverage, and is ideal for a wide variety of manufacturing applications.