Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9158028 for sale
URL successfully copied!
TEL Photoresist TEL / TOKYO ELECTRON Clean Track Mark 7 (TEL Clean Track Mark 7) is a state-of-the-art photoresist developer, designed to meet the needs of today's advanced semiconductor manufacturing processes. The photoresist developer is used to etch patterns onto wafers, ensuring that patterns are accurately reproduced during lithography steps. TOKYO ELECTRON Clean Track Mark 7 is designed to provide superior cleanliness and uniformity. The equipment uses a proprietary ASCENE™ background cleaning solution, which provides exceptionally low background levels and uniformly distributed particles. This allows for more accurate processing of delicate photoresist patterns. The system is also equipped with an advanced, high-precision exposure stage, which enables precise and repeatable exposures. Clean Track Mark 7 also features a powerful image analysis unit for the optimization of pattern etching. This machine allows for analysis and evaluation of developed resist patterns, ensuring the best possible results. The integrated resist coater/developer easily processes both conventional and novel photoresists, making it well-suited for a variety of semiconductor device processing applications. In addition, TEL / TOKYO ELECTRON Clean Track Mark 7 is equipped with a powerful gas flow handling tool for the control of gaseous materials, such as halogen, fluorine, nitrogen, ozone, and oxygen. This asset ensures that only the correct gas concentrations are used to clean wafers during resist development processes. The model has been designed and built with safety in mind, and features a series of safety components, including full-spectrum safety interlocks, alarm systems, and emergency stop buttons. The equipment has also been certified by TÜV Rheinland Semiconductor, a third-party testing laboratory specializing in semiconductor manufacturing equipment. Overall, TEL Clean Track Mark 7 is an advanced photoresist developer designed to meet the rigorous demands of today's advanced semiconductor device manufacturing processes. The system features sophisticated exposure, pattern analysis, and gas flow handling capabilities, which ensure high-quality images and wafer cleaning. The unit has been built with safety in mind and has all the required certifications from a respected third-party testing laboratory.
There are no reviews yet