Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9165479 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment technology designed to improve the production and performance of advanced semiconductor devices. This system uses an array of different sources to produce a uniform and consistent dose of light across the areas of its target substrate. Photoresist systems are becoming increasingly important in the semiconductor industry, as they are necessary to accurately expose the substrate in order to achieve the desired effects. TEL Clean Track Mark 7 is designed specifically with the intention to reduce both the cost and complexity of operations, in particular, the predefined intensity and uniform dose of light delivered across the wafer. TOKYO ELECTRON Clean Track Mark 7 unit consists of a number of integrated components comprising an optical component, a controller, and a resist process control unit. The optical component utilizes an optimized illuminator to deliver light onto the substrate in a precise and uniform way. This ensures that accuracy and repeatability of the photoresist process is achieved. The controller is responsible for regulating the intensity of the light emitted and measuring the dose, thus providing feedback and control to the optical component and resist process control unit. The resist process control unit is used to control theChemical-Galvanic and Dry-Infiltrate processes, and plays a critical role in optimizing process parameters of etching. In order to address the key issues associated with the photoresist process, Clean Track Mark 7 machine is designed with a number of salient features such as improved thermal profile, precise timing and uniform light intensity across the substrate. To facilitate this, a high-efficiency photon detector and a uniform light source are integrated into the tool. Additionally, a precise control of the dose and exposure time is carried out by the controller. These features guarantee efficient and accurate operations, thereby maximising productivity and lithography yield. Furthermore, TEL / TOKYO ELECTRON Clean Track Mark 7 asset is equipped with a 10-inch diffusion plate, which enables finer patterns to be etched on the substrate, thus providing improved process window optimization. Additionally, the resist thickness can also be measured in real-time with a special sensor, further enabling precise resist processing control. Overall, TEL Clean Track Mark 7 model is an optimal choice for contact printing and lithography in semiconductor processing. It boasts advanced features like a finely tuned optical component, accurate controller and improved resist processing unit. These components combine to deliver precise and uniform light dose across the substrate, effective thermal profile and precise control of the doses and exposure time. As a result, TOKYO ELECTRON Clean Track Mark 7 equipment enables efficient and cost-effective semiconductor production.