Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9158026 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7
ID: 9158026
(4) Developer system Dual block.
TEL / TOKYO ELECTRON Clean Track Mark 7 is a state-of-the-art photoresist equipment designed to improve production yield for IC and semiconductor manufacturers. The system applies a photo-polymer "ink" to prefabricated thin metal, polyimide, and other film substrate wafers, allowing precise patterning of photoresist. TEL Clean Track Mark 7 offers an advanced integrated-in process alignment function, which enables quick and accurate alignment for exposure to patterns up to 0.25µm. This feature improves the photosensitization accuracy for patterns on the order of 0.6 µm. The machine also features an Auto-Warmup option, offering a quick heating process prior to the exposure process and preventing exposure abnormalities due to uneven temperature. The unit utilizes the ultra-short-wavelength excimer laser to improve the precision of photosensitive images. This laser offers higher-brightness and a larger area of exposure, allowing for shorter exposure time with less machine cycle time. Additionally, the laser offers a higher resolution compared to traditional systems by reducing the minimum feature size and effectively decreasing the variation. TOKYO ELECTRON Clean Track Mark 7 also features built-in Decontamination Tool (DCS) process. The DCS is designed to clean out any contaminates in the imaging and exposure area prior to exposure. This feature reduces the chance of contamination during the exposure process and helps improve the accuracy and stability of the photoresist patterning process. Clean Track Mark 7 is equipped with several options for customizing the best matching conditions for the specified materials and application. The asset's advanced features are equipped with an array of customer support services, including such services as remote diagnostics, model maintenance and software upgrades. All of these features make TEL / TOKYO ELECTRON Clean Track Mark 7 one of the most reliable and efficient photoresist systems for semiconductor and IC manufacturing.
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