Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9158027 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment used in the manufacturing of integrated circuits (ICs). The system works by exposing an IC substrate to a UV light source, which atomizes photoresist where the UV light falls. The unit is used in the creation of many different types of ICs, including digital logic, analog devices, and application-specific integrated circuits (ASICs). The machine is composed of several parts: the photoresist supply, the photoresist developing unit, the mask alignment tool, the photoresist exposure asset, and the photoresist removal unit. The photoresist supply component is responsible for supplying and storing photoresist in a manner that ensures its cleanliness and ensures the same conditions for each mixture. The photoresist developing unit helps to ensure consistent and accurate photoresist development. It is responsible for accurately positioning and measuring the photoresist mixture, and then controlling the developing process for consistent results. The mask alignment model is responsible for ensuring accurate transfer of the photoresist from the mask to the IC substrate. This component aids in the proper alignment of the photomask over the wafer, so that the correct features are accurately transferred onto the IC substrate. The photoresist exposure equipment is responsible for controlling the UV light source, and its uniformity and power. This ensures that the photoresist is exposed evenly across the entire photomask, and also ensures that the desired patterns are accurately transferred onto the IC substrate. Lastly, the photoresist removal unit is responsible for managing the photoresist etching process. This includes the timing of the etching process, the chemical components used in the etching process, and ensuring that the etching process is kept clean throughout the entire process. TEL Clean Track Mark 7 is a powerful and reliable system for photoresist applications in the manufacturing of integrated circuits. It combines several systems into one in order to effectively and accurately perform photomask alignment and photoresist exposure. The unit allows for uniform transfer of photoresist onto IC substrates, and it is capable of accurately controlling the developing and etching processes for superior results. The machine is well-suited for a variety of IC production needs and is relied upon by the majority of IC manufacturing facilities.