Used TEL / TOKYO ELECTRON Clean Track Mark 7 #9243712 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment designed to provide high-level wafer cleaning for precision lithography operations. This system enables utmost accuracy in pattern creation, as it utilizes industry-leading wet-process equipment for post-process wafer cleaning and film development. In addition, it enables cleaner process control and improved process stability. TEL Clean Track Mark 7 unit is constructed with an Easy-Close Door Cover Assembly, which is designed to be airtight and minimize environmental contamination. This ensures that the environment within the machine is properly maintained, and optimal material results are produced. It is also equipped with a "CFM", which is an automated cleaning fluid mixing module which ensures that TOKYO ELECTRON Clean Track Mark 7 has an optimized and balanced cleaning operation. The tool also utilizes an advanced wet-process cleaner and film developer. This mechanism makes use of specialized agents to rapidly and thoroughly clean wafers while removing any inconsistencies within the pattern. Additionally, the film developer works to develop the photoresist material layer, creating an accurate and clear pattern. Clean Track Mark 7 asset is designed for optimal usability. It is an intelligent model, which automatically detects the type of wafer that is being processed and adapts its operation conditions accordingly. This boosts its processing accuracy and consistency. The equipment can also be programmed to store up to 350 programs, allowing for easier and faster operation with minimal manual input. The system is also reinforced with a protective alarm feature to ensure complete safety. This alarm can detect any potential levels of leakage and adjust the operation process accordingly. This helps to prevent any environmental contamination, as well as the chance of any injury. TEL / TOKYO ELECTRON Clean Track Mark 7 unit is a powerful and advanced photoresist machine, designed to bring the highest precision and without compromising usability. It offers cleaner process control and improved process stability, while providing ultimate accuracy in pattern creation. It is the perfect tool for complex lithography operations.