Used NOVELLUS CONCEPT 2 Speed DLCM #9109574 for sale

NOVELLUS CONCEPT 2 Speed DLCM
ID: 9109574
Wafer Size: 8"
Vintage: 2000
System, 8" Chamber SSD 2000 vintage.
NOVELLUS CONCEPT 2 Speed DLCM is an advanced, multi-functional chemical vapor deposition (CVD) reactor that delivers an increased level of speed, throughput, and efficiency. It is designed for high density materials applications such as Copper, Rhodium, and Aluminum, and includes a number of features to ensure precise control of deposition conditions. The reactor utilizes a unique carrier design, with a dual-speed high-fit gas distributor, a linear scan stage, and an adjustable direct liquid cooling mechanism to ensure superior temperature uniformity. The direct liquid cooling mechanism allows quick process cooling, and prevents thermal damage to the substrate. CONCEPT 2 Speed DLCM also has a semi-permeable magnetic field stop layer, which limits the entry of oxygen and other gases into the deposition zone. This feature enables improved control of deposition rate and uniformity. The Novello NOVELLUS CONCEPT 2 Speed DLCM also features a two-stage microwave plasma discharge system, which allows for precise control over the ionization and deposition parameters. The linear scan stage provides fast and accurate scanning of the reactive gas and reduces both gas-phase noise and gas mixing. CONCEPT 2 Speed DLCM is easy to use, and highly programmable with multiple functions for precise deposition control. The user interface is designed to be simple and intuitive, with touch-screen controls and large graphical LCD displays for easy monitoring of deposition parameters. The process parameters, including gas flow, temperature, pressure, and microwave frequency can be adjusted in real-time, providing a high level of control over the deposition parameters. Finally, NOVELLUS CONCEPT 2 Speed DLCM utilizes advanced safety features for a safe and consistent operation. It is designed with interlock circuitry to stop process reactions if unexpected conditions are detected. Additionally, the reactor uses advanced particle monitoring and filtration system to improve the safety and quality of the deposition process. Overall, CONCEPT 2 Speed DLCM is a high-performance deposition reactor designed to enable the deposition of high-density materials with speed and precision. This reactor is ideal for process engineers, research scientists, and academic labs, since it offers excellent control of deposition parameters with reliable safety features.
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