Used EMITECH / EDWARDS K575X #293608604 for sale

EMITECH / EDWARDS K575X is a sputtering equipment designed for deposition of thin films on substrates. It is composed of four main components: a high-performance power supply, an ion source, ion optics, and a vacuum chamber. The power supply provides the necessary voltage, up to 5 kilovolts, to create a plume of plasma containing ions and electrons. The ion source is an array of coaxial glow discharge electrodes, which provide a uniform plasma field with low pressure and small-emittance. The ion optics, comprised of an inner and outer grid, are used to filter the ions and ensure uniform ion bombardment of the substrate. The vacuum chamber is sealed and designed to maintain a desired atmosphere and contain all the sputtered material during the deposition process. EMITECH K575X system is capable of depositing a variety of materials, including metals, oxides, nitrides, and alloys. Metal films can be deposited at high deposition rates for rapid, economical deposition of thin-film layers. The sputtered material is highly uniform and contains no pinholes, drift, or cracks. Oxides, nitrides, and alloys can be deposited at lower rates, but with increased uniformity. The chamber is designed to maintain optimal conditions for deposition including pressure, process gases, target gap, and substrate temperature. The chamber is capable of being contaminated, and requires regular cleaning to ensure optimum deposition of the desired material. The unit can be automated with SEMI-standard processes, enabling easy integration into existing production lines. Various accessories, such as mini chambers, substrate holders, and process modules, are available for specific processes. EDWARDS K575X is an ideal machine for fabricating large-area substrates, fine-grain multi-layered films, and precise coatings for a variety of industrial and research applications. The tool is also able to generate highly reliable data, including thickness, uniformity, and other parameters for optimal control of the deposition process.