Used EMITECH / EDWARDS K575X #293608605 for sale

EMITECH / EDWARDS K575X is a high-end sputtering system used for deposition of thin films of materials such as metals, alloys, and oxides for a variety of research and industrial applications. The system consists of an RF power source, magnetron source, vacuum chamber, and process gas regulator. The RF power source is a solid-state, high power source with a frequency of 13.56 MHz and a maximum output power of 35 kW. This allows for precise control of thickness and prescriptive coating parameters over large areas. The magnetron source uses permanent magnets to control the plasma shape and features an adjustable power supply and tuning control for controlling the plasma parameters. This allows for achieving uniform deposition of the target material over the large area. The vacuum chamber is constructed of stainless steel and has a capacity of 2 m3, with a base pressure of less than 5x10-5 mbar. It is compatible with several types of substrates, including flat or cylindrical substrates, with a substrate size up to 200mm in diameter. It also includes a gas inlet and exhaust, allowing for adding a reactive gas during the sputtering process for improved film properties. The process gas regulator allows for adjustment of the process gas pressure, which can be quickly monitored using an in-line gauge. This allows for precise control of the process parameters required for obtaining desired film properties. Additionally, it features a dual zone function, allowing for different parameters to be applied to different substrate areas in the same run. EMITECH K575X is powerful and highly versatile sputtering system with many features that enable an efficient and precise sputtering process. It is suitable for use in research and industrial applications, such as the deposition of thin films for semiconductor and optoelectronic devices.