Used SIGMA Sputtering System #193698 for sale

SIGMA Sputtering Equipment is an advanced, state-of-the-art Sputtering System designed to deposit thin films onto a substrate. It is used in a variety of applications, such as semiconductor device fabrication, optical coatings, research and development, medical, and many other industries. The unit consists of a small chamber, which is filled with argon gas, and a power supply with a variable voltage setting. A target material, such as aluminum or titanium, is placed on the cathode plate inside the chamber and it is positively charged to generate a plasma. The plasma generates an ionized plasma stream of particles, which bombard the target material, releasing positively charged ions. These ions are then attracted to the negatively charged substrate surface and metal atoms are deposited onto the substrate in a thin layer. SIGMA Sputtering Machine is controlled by a sophisticated software suite that allows users to set a wide range of parameters to achieve optimum results. Users can adjust various parameters to optimize the tool, such as the deposition rate, the ion concentration and the deposition uniformity over time. The software also allows users to monitor and control the deposition rate, enabling them to stop and start as needed without interfering with the final deposition process. Sputtering Asset also features a dry-assist sputter model that helps prevent unwanted particles from attaching to the substrate. The equipment is equipped with a post-process dry etch to further purify the deposit layer by removing any particles or contaminants that may be on the substrate surface. In addition, SIGMA Sputtering System offers a wide array of accessories, such as sample feeders, wafer handlers, cassettes, and fixtures, among other features that make the unit more versatile. Overall, Sputtering Machine is an advanced and reliable solution for metal deposition applications. It's highly customizable and offers users a variety of parameters to choose from to achieve the desired results. Furthermore, its dry-assist and post-process etch features ensure an even and pure deposition layer.