Used TRIKON / ELECTROTECH Delta 201 #293621505 for sale

TRIKON / ELECTROTECH Delta 201 is a high-performance sputtering equipment developed for the deposition of thin films on various substrates. This system is a single-source, multi-chamber, open-frame sputtering unit that allows for a wide range of process parameters and is ideal for demanding applications in both research and industrial settings. TRIKON Delta 201 offers five chambers for sputter coating, including a load/unload chamber, large main chamber, and small chamber. The chambers are electronically and pneumatically isolated from each other and feature a vacuum range from 0.5 to 1.0 mTorr. The machine delivers high deposition uniformity. Adjustable cryo and heating anchors allow the substrate temperature to be precisely controlled. ELECTROTECH Delta 201 can accommodate a variety of substrates, including metals, ceramics, glasses, and wafers up to 8" in diameter and up to 4 inches thick. The tool features a flat, dry platen with a choice of either linear, rotary, or laboratory manual transfer loading options. The adjustable end-zone height and flexible y-zone range make it possible to fine-tune process parameters for a variety of substrates. Delta 201 is equipped with TRIKON patented "TDC-200" Deposition Controller, which has an intuitive interface and user-friendly navigation. This controller provides easy access to all process parameters and recipes, while allowing control of all 5 sputtering chambers simultaneously. The controller features an RF choke and a wide variety of process monitoring functions. The sputtering capabilities of TRIKON / ELECTROTECH Delta 201 are second-to-none. It features ELECTROTECH patented "Icarus" inert-gas shower, which increases sputtering efficiency and delivers a wide range of sputtering processes. The Lift-off™ target configuration delivers uniform sputtering, excellent material utilization, and highly controllable film thickness profile. Overall, TRIKON Delta 201 sputtering asset is an advanced and versatile deposition model. It provides users with high-precision control of process parameters, with excellent uniformity and repeatability. The equipment is able to perform a wide range of sputtering processes with excellent material utilization and controllable film thickness profiles, making it suitable for a variety of applications.