Used TRIKON / ELECTROTECH ND-6210 #9123641 for sale

ID: 9123641
Wafer Size: 6"
PECVD System, 6" Process: SiN-SiC (Sio2) Gases: CF4, O2, N2, N2O, SiH4, NH3, SiH4/Ar-5%, CH4 Manuals included.
TRIKON / ELECTROTECH ND-6210 is a high-performance sputtering equipment designed for use in a variety of industrial, laboratory, and research applications. This sputter deposition system is comprised of a deposition chamber, an electromagnetically driven target, and associated power supplies and control systems. The unit also features a gas delivery machine and precise vacuum controls for excellent environmental control. TRIKON ND-6210 enables controlled sputter deposition onto substrate materials, such as metals, semiconductors, and glasses, as well as onto a variety of film materials. This tool uses magnetron sputtering technology, which is a well-proven technique for depositing thin films onto a substrate material. This sputtering technique creates the desired thin film material with the required characteristics by bombarding the substrate surface with magnets and providing the necessary power supply. ELECTROTECH ND-6210 uses state-of-the-art electronic and control systems for precise monitoring and control of the deposition process. The asset includes temperature and pressure sensors to maintain and optimize the sputtering conditions. ND-6210 takes deposition to a new level with its precise flow control of reactive and inert gases. This model can also be used for polymer deposition, sputter etching, and multi-target configurations. Furthermore, the equipment can incorporate a range of substrates, including silicon, ceramic, and thin-film solar cell materials. TRIKON / ELECTROTECH ND-6210 is an affordable and efficient option for those looking for high-quality sputtering systems. The system offers a range of features and benefits, such as excellent process control, automated operation, and excellent uniformity in the deposited film. This unit is highly reliable and offers excellent performance in a variety of industrial and research environments.
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