Used VARIAN / INTEVAC MDP-1100 #293596074 for sale

VARIAN / INTEVAC MDP-1100 sputtering equipment is widely used for thin-film deposition in a variety of applications such as display, semiconductor, and optoelectronic devices. This system is a versatile tool capable of depositing a variety of materials including metals, inorganic insulators, and oxides using a broad range of deposition parameters. The unit is composed of several parts, the main components being the RF power supply, the chamber, the sputtering cathode, the vacuum machine, and the power source. The RF power supply is used to create and maintain a low-frequency plasma in the chamber. This low-frequency plasma is then used to efficiently sputter target material off the sputtering cathode and onto the substrate to form the desired thin film. The plasma is created by controlling negative and positive DC voltages that modulate the energy needed to break off the sputtered material. The chamber consists of a base, a bell-jar, and a set of valves. The base allows the operation of the tool while maintaining the controlled environment within the chamber. The bell-jar is usually made from low-conductivity aluminium and is able to hold the materials to be sputtered without any interference from the ambient environment. Additionally, the valves can be used to introduce, extract, or recycle a variety of materials for sputtering and filming. The sputtering cathode consists of a relative shape to the target material acting as a target holder, either mounted on a pedestal or in a rotary-type sputtering asset. It consists of the target material and a supporting structure for the magnetron. The magnetron helps create the plasma necessary for the sputtering process. The vacuum model is used to maintain the proper pressure inside the chamber. It consists of several components, such as the roughing pump, the turbo pumps, cryo pump, and the mechanical pump, that are used to maintain the vacuum pressure needed by the sputtering process. The power source supplies electrical energy to the RF power supply and the other components of the equipment. Depending on the requirements of the sputtering process, DC or AC voltage may be supplied. In summary, VARIAN MDP-1100 is a powerful and versatile sputtering system capable of depositing a wide range of thin films. The unit's components work in unison to ensure the best sputtering result, making it one of the most popular systems for deposition applications.