Used AMAT / APPLIED MATERIALS VeraSEM #9200200 for sale
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Wafer Size: 12"
Critical Dimension Scanning Electron Microscope (CD-SEM), 12" 2002 vintage.
AMAT / APPLIED MATERIALS VeraSEM is a state-of-the-art system used for wafer testing and metrology. It combines a high-resolution scanning electron microscope (SEM) with a wide range of automated measurements and imaging capabilities. This enables users to quickly and accurately measure wafer and die characteristics, such as critical dimensions, device topography and a wide range of electrical device properties. AMAT VeraSEM also allows users to rapidly characterize doping profiles and perform benchmarking of device performance among various samples. With its robust design and advanced capabilities, APPLIED MATERIALS VeraSEM is ideal for use in semiconductor device development and process characterization. It provides detailed characterization of microelectronic components and enables the measurement of electrical characteristics with nanoscale resolution and accuracy. This makes it a valuable tool in the semiconductor industry for device failure analysis and yield monitoring. VeraSEM's advanced imaging capabilities feature high-resolution SEM and electron beam induced current (EBIC) imaging to enable die-to-die comparison. This helps to pinpoint device and individual transistor defects for further analysis. VerSEM also offers spectroscopic imaging capabilities that enable users to perform chemical analysis down to the nanometer scale. In addition, its automated measurement capabilities are second to none in the industry. AMAT / APPLIED MATERIALS VeraSEM is able to measure the smallest features with its 10 nanometer resolution, making it one of the best wafer probing solutions available. The system also offers an advanced suite of software tools, including automated pattern recognition and defect classification, which improve the workflows of many engineers and researchers. Overall, AMAT VeraSEM is a highly versatile and sophisticated wafer testing and metrology system that offers detailed and accurate results. Its powerful imaging and automated measurement capabilities make it an invaluable tool for semiconductor device development and process characterization. It is suitable for a wide range of applications such as failure analysis, benchmarking, measurement of critical dimensions and electrical properties and more.
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