Used KLA / TENCOR / PROMETRIX 6200 Surfscan #163303 for sale
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ID: 163303
Wafer Size: 4" - 8"
Vintage: 1994
Particle counter, 4" - 8"
Non-patterned surface inspection system
With Ar-laser
Defect sensitivity (PSL STD): 0.1 micron
Haze sensitivity: 0.02 ppm
Haze resolution: 0.002 ppm
Accuracy: Within 1%
XY Coordinates
Argon ion laser: 488nm
NIST Calibrated
Lock down accessories
Blower assembly
MS-DOS 6.22, Windows 3.1
Main power module
Power supply module
Controller
Laser module
Indexer
Manuals
Power: 208 V, 60 Hz, 17 A
1994 vintage.
KLA / TENCOR / PROMETRIX 6200 Surfscan is a high-precision platform for automated wafer testing and metrology. KLA 6200 Surfscan equipment enables automated real-time measurement of topography, thin film thickness, and defects in semiconductor wafers and substrates. TENCOR 6200 Surfscan system is equipped with an advanced CCD sensor that can capture precise 3D topographic images of a semiconductor wafer. It can measure sample topography for accurate thin film thickness measurements and defect characterization. The unit's precise control of the scanning head and software algorithms ensure precise and reliable measurements. PROMETRIX 6200 Surfscan machine is capable of measuring various wafer structures and layers including metal vias, large pitch pitch interconnects, and other complex structures with a maximum scan field of up to 13mm. The tool is also able to measure wavelength-dependent characteristics of thin films with a maximum measured range of 50nm - 10mm. Additionally, 6200 Surfscan asset features an automated defect analysis library that can detect complex defects such as dislocations, stacking fault, and threading loops. The software can quickly identify and classify defects, enabling users to quickly analyze the wafer's defect structure. In addition, KLA / TENCOR / PROMETRIX 6200 Surfscan model is designed to perform on-line real-time wafer characterization, meaning that subtle changes in the wafer structure can be quickly detected and classified. It also features a balanced field illumination equipment integrated with a high-resolution stage to ensure precision and accuracy for each scan. Finally, with a scan speed of 3nm/sec, KLA 6200 Surfscan system provides high throughput for automatic wafer testing and metrology. It has a range of automation options that can reduce the time and complexity involved in wafer characterization, making it an ideal choice for semiconductor processes that require highly precise measurements.
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