Used KLA / TENCOR 6420 Surfscan #293766824 for sale

KLA / TENCOR 6420 wafer testing and metrology equipment is a world leading production line-micro inspection tool that helps to ensure that semiconductor devices meet required specifications. It offers highly accurate, automated, in-line measurements and inspections, high-speed pattern recognition, electrical metrology for parameter screening, and defect isolation and classification for process analysis. KLA 6420 wafer testing and metrology system has revolutionized the way semiconductor manufacturers test and monitor fabrication processes. The unit combines inspection and metrology functions, producing images of each device at the point of inspection or metrology for feedback. It supports a wide range of process technologies, including photomask, thin film measurements, layer to layer inspections, defect classifications, etch process monitoring, overlay, memory defect analysis and much more. The automation subsystem ensures correct alignment and identification of each lot while the machine also provides an integrated wafer level test that automates the entire inspection process. TENCOR 6420 helps to increase production yields and reduce overall manufacturing costs by detecting subtler defects that might have gone unnoticed previously, resulting in higher quality products and greater customer satisfaction. Its precision measurements and high accuracy increase device performance leading to increased yields, which result in improved economic performance. The tool has a user-friendly interface, allowing device makers to quickly configure and customize tests and instrument settings, eliminating tedious setup and calibration times. Its high-speed ability to measure really close up provides detailed analysis to identify fundamental defect mechanisms, and it can provide comprehensive information about etch process control, layer to layer inspection, complex thin film measurements, layer stack defect analysis and advanced metrology. The advanced image analysis technology present on 6420 helps to reduce false calls by recognizing features of all sizes, even those that may be ten percent of the expected size. Line edge consistency is also accomplished thanks to the asset's versatile, multi-level edge follower algorithm. This all contributes to a highly reliable model that increases productivity, drives down costs and results in an overall improvement in production.