Used KLA / TENCOR / PROMETRIX Omnimap RS-55TCA #9261757 for sale

KLA / TENCOR / PROMETRIX Omnimap RS-55TCA Wafer Testing and Metrology equipment is designed to provide comprehensive defect physics characterization and analysis for semiconductor manufacturers. It integrates several technologies into a unified system to address wafer metrology processes for both production and research applications. The main features of the unit include: Tapping AFM (Atomic Force Microscopy): Allows for imaging and real-time measurement of nanostructures on the wafer surface with high resolution. RS-50 Raster: Provides high speed, non-contact metrology of the entire wafer surface, including the substrate, contact pads, and other features. STARFISH Edge Detection Machine: Automatically detects wafer edges in order to provide precise alignment information for subsequent imaging and measurement processes. Lateral Force Microscopy (LFM): Enables real-time mapping of the forces between a probe tip and the wafer surface with a resolution of 1 nanometer or less. Coaxial Probe Scanning: Coupled with LFM, this feature enables control of probe tip deflection in order to generate a precise topography map. FPD-JV1010 Deformable Mirror: Used to control the angle of incidence of a focused optical beam in real-time. This allows for simultaneous high speed imaging in multiple directions. Electrostatic Force Microscope (EFM): Enables nano-scale imaging and surface analysis in non-contact mode. "Wafer level" Fluidic Tool: Through adjustment of vacuum and pressure, as well as flap valves, this asset enables full stand-off control of fluid levels. This is used to accurately deliver fluids, such as polarizing solutions or fluids containing markers, to the wafer surface. VME Computer Based Data Acquisition & Control Model: Based on an industrial VME architecture, this computer allows for real-time control over instrument operations, as well as data collection. This wafer testing and metrology equipment provides a versatile, precise, and powerful platform for a wide range of characterization needs. With its advanced imaging capabilities, as well as its wide range of analysis options, KLA OMNIMAP RS-55/TCA is perfectly suited to both production and research applications.