Used KLA / TENCOR / PROMETRIX P-20H #9212478 for sale

ID: 9212478
Wafer Size: 8"
Long scan profiler, 8".
KLA / TENCOR / PROMETRIX P-20H Wafer Testing and Metrology equipment provides efficient and accurate testing and metrology of wafers for production and research applications. This advanced system consists of a number of components to measure wafers including a Testing Stage, Measurement Unit and Alignment Machine. The Testing Stage portion of the tool is designed for testing and analyzing wafers of different sizes, shapes, and between 100 - 500 microns thick. The stage includes a vacuum asset with an activation and control panel and a manually operated X-Y translator. It can hold up to 6 wafers and provides an adjustable height platform for holding pieces on the stage. The wafers can be measured individually or simultaneously with the testing program running in the background. The Measurement Model includes a laser interferometer, position sensors, and wafer-tracking software for high-resolution imaging and measuring capabilities. The measurement equipment is coupled with the wafer stage to provide precision measurements of the wafer's surface topography and configuration. Additionally, the wafer-tracking software can detect defects, measure wafer critical dimensions, and track changes in wafer thickness. Finally, the Alignment System consists of two components: a laser diode-based projection unit and a high-precision video camera. The camera enables precise alignment of the laser diode to the wafer surface in order to accurately measure and inspect the wafer surface. It also has the ability to correct any alignment errors that may occur due to movements within the wafer. KLA P-20H Wafer Testing and Metrology Machine is an advanced tool for accurate and efficient testing and metrology of wafers. It can provide precise measurements of the wafer's surface topography, detect defects, measure critical dimensions, and track changes in wafer thickness. The advanced alignment asset can also correct for any alignment errors that may occur due to movements within the wafer. This model is ideal for production and research applications.
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