Used KLA / TENCOR / PROMETRIX RS-55 #293747952 for sale

ID: 293747952
Vintage: 1995
Resistivity mapping system (2) Peripherals 1995 vintage.
KLA / TENCOR / PROMETRIX RS-55 is a precision metrology equipment designed for wafer inspection and metrology. The system combines a two-axis stage, advanced imaging optics, software-controlled motion control, and a variety of sensors and gauges, providing complete coverage and characterization of surface topology and defect characterization. The stage is capable of X-Y movements of up to 375mm, with the option of adding a Z-axis scan capability, enabling the wafer to be moved in 3 axes. The stage also features a low-vibration option. The optical imaging is provided by a combination of Laser Confocal Profilometry (LCP), Visible-Light Reflective (VLR) imaging, and Scanning White Light Interferometry (SWLI), enabling full-surface imaging and complete defect coverage and characterization. The motion control platform is powered by a high-performance motion controller, running on the Siemens S7 PLC platform. This motion controller is capable of both open- and closed-loop control, depending on the specific application. The unit has an integrated optical control, providing high-precision control of the stage motion over the entire scanning area. The motion control is integrated with a variety of sensors including a capacitive touch sensor, laser scanning, and X-ray microscopy for defect analysis. The machine is powered by KLA analysis and metrology software, which provides analysis and reporting capabilities, such as full device characterization, defect analysis, and image analysis across the entire wafer surface. The software also includes comprehensive statistical methods and algorithms, enabling real-time feedback on process optimization and defect analysis. KLA RS55 is a versatile, highly integrated, and reliable wafer testing and metrology tool. Its combination of advanced imaging optics, motion control, and software-control provides complete coverage and characterization of surface topology and defect characterization, giving users the ability to produce highly accurate results.
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