Used KLA / TENCOR / PROMETRIX RS-55 #9157661 for sale

ID: 9157661
Wafer Size: 5"
Resistivity mapping system, 5".
KLA / TENCOR / PROMETRIX RS-55 Wafer Testing and Metrology Equipment is a fully automated, high-throughput metrology platform for wafer characterization. It employs advanced optical scatterometry techniques to measure critical parameters such as film thickness, roughness, and optical constants with high accuracy and precision. The system is ideal for through-silicon via (TSV) processes, MEMS devices, and 3D Integration technologies. KLA RS55 unit utilizes the most sophisticated, state-of-the-art optical imaging technology for greater accuracy. It employs two optical scatterometers, both of which use a null equation method for accurate parameter determination. The machine extracts critical data from wafers of different sizes and characteristics based on the unique scatterometry imaging principles. In addition, its automated optical alignment algorithms ensure accurate characterization of even the most challenging wafer geometries. TENCOR RS 55 is equipped with a powerful on-board data analysis suite, allowing users to run multiple process control checks and analyze wafer data in real-time. This tool also features an intuitive graphical user interface (GUI) to get a better understanding of the current process by comparing its results with historical datasets. The GUI can be used to create custom operating profiles, ensure greater process control, and generate reports. The main advantages of KLA RS 55 are its robustness to surface features, its ability to measure multiple parameters, and its high throughput. The tool can measure over 10 parameters simultaneously, including thickness, step heights, optical constants, and diagnostics. In addition, KLA RS-55 operates in combination with specialized Automated Process Control (APC) software, which ensures performance reliability and repeatability to maximize process yields. In conclusion, RS 55 Wafer Testing and Metrology Asset offers a reliable, cost-effective solution for wafer characterization and process monitoring. The model's advanced optical imaging technology and automated process control provide accurate, repeatable analysis, ensuring the highest levels of quality across your wafer processes.
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