Used KLA / TENCOR / PROMETRIX UV 1050 #9172589 for sale

KLA / TENCOR / PROMETRIX UV 1050 is a wafer testing and metrology equipment designed for the sub-micron to nanometer range. The system features a high-resolution imaging unit for defect identification on wafers. Its fast scanning speeds and multithreaded scanning architecture make it ideal for the accurate identification of defects in demanding production environments. Utilizing an ultraviolet (UV) light source, the 1050 also features precise pattern recognition capabilities to identify complex patterns that may indicate defects. KLA UV 1050 has a modular build with adaptable parts and components. Its core components consist of a stage, camera, illumination, and software control machine. The stage uses accurate and repeatable scanning motion to provide high-resolution imaging with precise image alignment. The camera captures sub-micron imaging data which is then processed using the on-board software package. The illumination tool allows the 950 to identify defects with both on-axis and off-axis lighting. In addition to high-resolution imaging and pattern recognition, TENCOR UV-1050 features several other capabilities. It includes wafer-to-wafer and die-to-die comparison capabilities for detecting process- and metrology-related defects. It can also perform wafer thickness measurement, wafer edge detection, and pattern overlay checks to ensure uniformity across a range of substrates. UV-1050 can be controlled with external tools such as a PC or laptop, or with an onboard control asset. Its versatile performance makes it ideal for use in both research and production environments. Its comprehensive specification list includes long-term reliability, flexible throughput, and minimal hardware requirements. When compared to traditional inspection methods, the model provides a significant cost savings in both time and money. PROMETRIX UV-1050 is a powerful wafer testing and metrology equipment that provides reliable and repeatable results across within a wide range of applications. It is highly customizable and can be adapted to a range of substrates and sizes. The system's flexibility, efficiency, and advanced imaging capabilities make it the perfect tool for the efficient inspection and characterization of challenging wafer substrates.