Used KLA / TENCOR / PROMETRIX UV 1050 #9310905 for sale

ID: 9310905
Thin film measurement system Amorphous silicon Oxide on aluminum Oxide on tungsten Transparent on transparent Oxide on poly Thickness range: 125 A to 250 A ±2.5 A 250A to 1.0 µm i1% Throughput: (90) Monitor wafers per hour, 8" (75) Pattered wafers per hour, 8" Pre-programmed focus (39) Patterned wafers per hour, 8" auto focus Absolute accuracy: Measurement time: 1.5-5 seconds typical per site Mapping: Die, Contour, 3-D.
KLA / TENCOR / PROMETRIX UV 1050 Equipment is a state-of-the-art wafer testing and metrology solution for semiconductor manufacturers. The system provides the latest technologies for defect inspection, thickness and feature metrology, and process management. KLA UV 1050 unit includes a suite of proprietary and industry-leading technologies, software, and services, providing an integrated solution that is designed for high wafer throughput and reduced downtime. TENCOR UV-1050 machine incorporates state-of-the-art technologies such as a 2x2 CCD imaging tool, ultra-low noise and resolution CCD camera, advanced illumination systems, fluoroscopy, and PC-based process control. This asset is specifically designed to meet the stringent requirements of the semiconductor industry. The model is also equipped with a variety of options such as automated alignment and imaging, a manual imaging stage, automated process control and recipe management, and other advanced features. Additionally, the equipment allows for integration with other equipment such as metrology, cleaning, defect inspection, and deposition systems. PROMETRIX UV-1050 system also includes an advanced UV inspection lighting unit that is designed for high wafer throughput while maintaining ultra-low noise sensitivity. This machine provides accurate defect positioning and mask inspection while compensating for uneven irradiance across the wafer-surface. Additionally, the tool provides precise illumination, angle dependent loss measurement, and flexible automation capability for manual in-asset wafer alignment. KLA UV-1050 model provides high throughput defect inspection capabilities with an integration of target table and image processing techniques. KLA / TENCOR / PROMETRIX UV-1050 equipment also features an innovative 'across wafer uniformity' system to ensure accurate metrology measurements. This unit is specifically designed to measure feature uniformity, defect sensitivity, and critical dimension measurements along all parts of the wafer surface. Additionally, the machine utilizes a number of proprietary algorithms to increase defect detection accuracy, minimize false detections, and eliminate possible defects. Overall, TENCOR UV 1050 Tool is a comprehensive wafer testing and metrology solution that is designed to meet the most rigorous of semiconductor industry requirements. It integrates both industry-leading technologies and proprietary technologies to deliver accurate, high throughput defect inspection capabilities. Additionally, it provides advanced alignment and image processing techniques, and across wafer uniformity systems to enable accurate measurement of feature uniformity and critical dimension measurements.
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