Used KLA / TENCOR / THERMA-WAVE OP 2600 #9130299 for sale

ID: 9130299
Wafer Size: 6"
System, 6"
KLA / TENCOR / THERMA-WAVE OP 2600 is a leading-edge wafer testing and metrology equipment used to measure, analyze, and evaluate semiconductor wafers for electrical, physical, and manufacturing defects. The system supports a wide range of research and development efforts, including advanced lithography and statistical process control. KLA OP 2600 unit is a fully automated optical metrology platform capable of measuring both 2D and 3D structures. It offers superior metrology accuracy, speed, and reliability over prior models, enabling greater measurement accuracy and reliability than ever before. TENCOR OP 2600 machine provides advanced mask and reticle performance monitoring, and is capable of quickly and accurately measuring both dense and isolated features. It also provides integrated Sub-Micron wafer inspection capabilities to ensure nearly perfect wafers are produced. The tool can measure line widths down to 0.03 micron with unparalleled speed and accuracy. Additionally, THERMA-WAVE OP 2600 can detect sharp-edge and line-width defects with superior speed and accuracy. Advanced tooling capabilities allow for full-wafer image analysis, permitting quicker and more accurate analysis of various masks and reticles. The asset also offers integrated Optical Frequency Domain Reflectometry (OFDR), allowing for the measurement of physical and electrical defects. The OFDR module of OP 2600 can detect defects down to 0.2 micron resolution, enabling the identification and quantification of micron-level defects. Additionally, the model is built with advanced capabilities such as 2D and 3D mapping, automated edge and pattern recognition, and CAD-like editing for data analysis. KLA / TENCOR / THERMA-WAVE OP 2600 equipment is capable of performing a range of wafer-level metrology tasks, such as line-width metrology, overlay metrology, defect detection and inspection, and 3D characterization. This level of performance is particularly helpful in production environments where a high degree of accuracy is required. The system is designed to support statistical process control, allowing for complete traceability of each wafer. This high level of accuracy and throughput provide an unparalleled advantage for the semiconductor industry. Overall, KLA OP 2600 unit is an advanced wafer testing and metrology machine, offering unparalleled speed and accuracy for measuring, analyzing, and evaluating semiconductor wafers. The tool's advanced tooling capabilities, flexible solution set, and excellent metrology accuracy provide a superior solution for everything from research and development to production environments.
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