Used KLA / TENCOR / THERMA-WAVE OP 2600 #9200134 for sale

ID: 9200134
Film thickness measurement system.
KLA / TENCOR / THERMA-WAVE OP 2600 is a wafer testing and metrology equipment that is designed to provide accurate, repeatable measurements of semiconductor products. The system uses an integrated two-laser, white-light phase-shift interferometer to measure a wide range of parameters on semiconductor wafers, including photolithography CD, dicing line width, overlay registration, and other parameters. The unit is also capable of measuring the electrical characteristics of the semiconductor device. KLA OP 2600 has several features which make it an excellent choice for measuring a wide range of parameters. The machine is equipped with a high-resolution CCD camera, which allows for precise measurements of wafer patterns, and a powerful microprocessor which allows the quick and reliable analysis of a wide range of parameters. The tool also includes a modular plate-table which can accommodate wafers of almost any size or shape, and can be equipped with a variety of optical components to measure different parameters. TENCOR OP 2600 uses a variety of software packages to analyze the data it produces, including programs for image processing, analysis of electrical characteristics, and analysis of overlay registration. The asset is user-friendly, and provides the user with a variety of graphical and tabular representations of the data that it produces. It also provides a variety of diagnostic tools to ensure that the model is functioning correctly. THERMA-WAVE OP 2600 is an invaluable tool for conducting wafer testing and metrology. It is easy to use, and produces reliable data on a wide range of wafer parameters. It can be used for both evaluation of a production process, as well as for research and development into new processes. The equipment is compact, durable, and provides reliable results quickly and accurately.
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