Used KLA / TENCOR / THERMA-WAVE OP 2600 #9250104 for sale

KLA / TENCOR / THERMA-WAVE OP 2600 is a wafer testing and metrology equipment used for the characterization of silicon wafers. This system is designed for measuring the thickness, refractive index, dielectric constant, and other parameters of a single wafer. It is capable of measuring 150mm and 200mm wafers in a single process, reducing cycle time and reducing maintenance downtime. KLA OP 2600 supports a variety of measurements including index of refraction, thickness, sidewall, thickness uniformity, dielectric constant, adhered film level, barrier layer uniformity, flatness, substrate quality, reflectivity, and roughness. These measurements are performed over variable frequencies and angles, allowing for a wider range of characterization results. Additionally, the unit is equipped with a variety of automated compensation techniques, for constant repeatability and precision. The machine is capable of processing up to four wafers simultaneously, with temperatures ranging from room temperature to 500°C. It includes a heated stage, allowing for the measurement of temperatures up to 500°C. The tool also enables real-time data acquisition, analysis, diagnostics, and control capabilities, allowing for a more efficient and optimized process. The asset also includes laser interferometry, a precision approach to measuring the wafer's optical thickness. TENCOR OP 2600 includes error-checking tools and provides customizable pre-and-post process software to help speed up production times. The model is equipped with an automated calibration station, ensuring accuracy and repeatability and eliminating manual calibration steps. Additionally, the equipment includes both an operator console and light bar graph to provide feedback to the user. Overall, THERMA-WAVE OP 2600 is a highly capable wafer testing and metrology system, allowing professionals to quickly and accurately measure a wide variety of parameters on a single wafer. Its versatility, accuracy, and repeatability make it a valuable and reliable tool for silicon wafer characterization.