Used KLA / TENCOR / THERMA-WAVE Optiprobe 2600 #9227997 for sale
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ID: 9227997
Vintage: 1994
Film thickness measurement system
Main tool
CRT Monitor
Mini environment kits
Optical plate
Card cage
Facility panel
W/L Housing assembly fan not working
ISOLATOR Knob position drift
1994 vintage.
KLA / TENCOR / THERMA-WAVE Optiprobe 2600 is an advanced wafer testing and metrology equipment. This versatile, cutting-edge system is designed for measuring, inspecting, and analyzing wafer topography. It features optics, motion control, data collection, analysis and reporting, and software designed to help yield engineer and process optimization. It enables accurate, reliable, repeatable, and efficient measurements of microscopic patterns on semiconductor wafers. KLA Optiprobe 2600 consists of a multisensor headoptometric, atomic force, fluorescence confocal, and digital imagingmetrology subsystems. This innovative unit is capable of measuring the size, shape, and orientation of the patterns on a wafer. The machine can detect the formation of defects and contaminants, enabling advanced analyses and characterization of materials and films. TENCOR Optiprobe 2600 also features sophisticated data collection, data analysis, and reporting capabilities. The tool utilizes data acquisition, signal processing, and image analysis tools to collect, store, and manage data. Advanced software tools allow users to customize reports and analyses as well as generate graphical representations of the data for further analysis. An additional advantage of Optiprobe 2600 is its user-friendly operation. Its user-friendly software is designed to streamline wafer testing processes, reduce writing and rewriting of programs, and optimize time and resources. It enables wafer professionals to make quick decisions, eliminate errors, and create more efficient processing and measurements. In conclusion, THERMA-WAVE Optiprobe 2600 is an advanced wafer testing and metrology asset that provides a high level of precision, accuracy, and reliability. With its sophisticated data collection, data analysis, and reporting capabilities, this reliable model is ideal for process optimization. From advanced patterning to defect and contamination inspection, this powerful equipment ensures accurate, repeatable, and efficient measurements of wafer topography.
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