Used KLA / TENCOR / THERMA-WAVE OPTIPROBE 3290 #9124948 for sale

ID: 9124948
Wafer Size: 4"-8"
Thin film measurement system, 4"-8" (2) Cassette loader stations Beam Profile Reflectrometry (BPR): Thick dielectric films > 500A Beam Profile Ellipsometry (BPE): Thin dielectric films < 500A Thermo electrically cooled diode laser: 675 nm Tungsten halogen lamp for spectrometry mode: 450 to 840 nm Spectrometry: Index films: C-Si Poly-Si A-Si Spot size: 0.9 Micron Optical parameters: Film thickness multiple layers Wide range thick and thin films Wide range index of refractions Extinction coefficient and reflectivity measurements Multi-layer and multi-parameter measurements: Thin ONO OPO Film stacks.
KLA / TENCOR / THERMA-WAVE OPTIPROBE 3290 is a wafer testing and metrology equipment designed to accurately assess the quality and uniformity of semiconductor devices. This system provides comprehensive measurements of a wide variety of device parameters across the wafer with high precision, speed, and accuracy. KLA OPTIPROBE 3290 consists of a 3290 optical microscope module and a 3200 automated wafer handling unit. The 3290 microscope supplies powerful diagnostic information with its enhanced optics, enhanced resolution, and a large field of view. The 3200 automated wafer handling machine offers industry-leading throughput and accuracy, allowing for high sample throughput. The 3290 Optiprobe provides the capability to measure device critical feature size, sidewall angle, corner rounding, shape, line width roughness, and more. This tool provides superior resolution to capture the smallest differences in device features. It also offers enhanced sensitivity to accurately measure nanostructures. Furthermore, the 3290 is optimized for non-contact and contact metrology, providing the ability to precisely measure and profile even the most difficult geometries. TENCOR OPTIPROBE 3290 also offers the industry's most advanced imaging capabilities, including extended depth of field and 3D stitch imaging. This asset includes proprietary KLA image acquisition and processing algorithms that provide improved accuracy and resolution for the most challenging imaging applications. OPTIPROBE 3290 provides automated defect review, enabling rapid correction of defects for improved quality. The 3290 provides an interactive review interface and customizable reporting options, giving users the ability to compare results from different locations across the wafer. By combining the 3290 microscope with the 3200 automated wafer handling model, medium volume semiconductor production and device characterization operations can benefit from increased throughput, accuracy, and improved wafer quality. THERMA-WAVE OPTIPROBE 3290 provides users with the accuracy, resolution, and flexibility they need for success in semiconductor manufacturing.
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