Used KLA / TENCOR / THERMA-WAVE Spectra FX 200 #9215204 for sale
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ID: 9215204
Wafer Size: 8"-12"
Vintage: 2005
Film thickness measurement system, 8"-12"
(2) Load ports
EFEM
UI
Insert type: Conversion, 8"
Data transfer: Floppy disk / DVD R/W
Operation: Mouse and keyboard
Door interlock
Recipe auto backup
Auto data deletion
Auto error log file save and classification
Queued loading (Queue recipe)
Spectroscopic ellipsometer
Spectrometer
Wavelength light source: 220 to 800 nm
Spot size: <30 µm (Thickness and Rl)
Spot size: <30 µm (Reflectivity)
2D and 3D Mapping function
Pattern recognition
Recipe copy with film library
SE and DBS Optics
Optic lens: 1x, 2x, 4x, 15x
Pattern score: FA
Screen
Recipe / Library import: TCP/IP (On-time intromit)
Wafer breakage: ≤1/1,00,000 Cycles
Signal tower
Options:
E30-98 Gem semi
E5-93 SECS II Semi
Recipe generator
Remote access capability
Carrier ID, 12"
E23, 12"
E84, 12"
E87, 12"
Safety shield for SO, 12"
HP 6122
HSMS Communication
Break beam mapper
Direct cable less power connection
E84 Enabled: OHT and AGV/RGV
OHT Lockout
Computer
Operating system: Windows XP
PHOENIX Handler
Controllers:
CPU: Pentium 4 3.0 GHz - P4 2.8 MHz
Memory: 1.024 GB DRAM
(2) Hard Disk Drives (HDD): 80 GB
Floppy Disk Drive (FDD), 3.5"
CD_R: 40X_8X (DVD RW)
Dongle
2005 vintage.
KLA / TENCOR / THERMA-WAVE Spectra FX 200 is a state-of-the-art wafer testing and metrology equipment. It is widely used in the semiconductor industry for testing wafers for a variety of parameters, from electrical characteristics to physical defects. The system is capable of accurately capturing a variety of data from the semiconductor wafer, and can be used to detect defects, measure electrical properties and perform statistical analysis. KLA Spectra FX 200 is comprised of three major components. The optical station houses the microscope, spectrophotometer, and polarimeters, which enable the unit to capture detailed information about the wafer's surface, structure, and composition. The interferometer unit is capable of capturing extremely precise measurements, including surface roughness, form factor, and layer thickness. Finally, the spectrograph station is equipped with a suite of analytical instruments that can measure and analyze the properties of the wafer in its entirety. This machine offers a wide range of features designed to improve accuracy and reduce testing time. It uses proprietary software and algorithms to speed up data analysis and provide better accuracy. A built-in databases makes it easy to store and recall data, while dual wavelength testing ensures that any deviations between the two sets of measurements are easily detected. The tool also offers a number of automated metrology processes designed to ensure optimal measurement and analyze results. The innovative design of TENCOR Spectra FX 200 ensures that it offers superior performance with fewer errors and a lower rate of failure. Its ability to detect minute defects and measure multiple parameters with incredible accuracy makes it one of the most reliable and advanced wafer testing and metrology systems available. Additionally, it can be configured to accommodate a wide range of wafer sizes and types, making it suitable for a variety of different applications.
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