Used KLA / TENCOR / THERMA-WAVE Therma-Probe 300 #293642292 for sale

ID: 293642292
Wafer Size: 8"
Vintage: 1989
Implant dosing measurement system, 8" 1989 vintage.
KLA / TENCOR / THERMA-WAVE Therma-Probe 300 is a wafer testing and metrology equipment designed for use in electronic and photonics industries. It delivers high-accuracy measurements with nanometrologic resolution and real-time data collection. This makes it an ideal solution for applications such as advanced lithography, research and development, and semiconductor fabrication. The system is capable of testing wafers up to 300mm in diameter and measuring thicknesses down to 1nm. It features an advanced automated stage for quick sample loading and positioning, with precision navigation and stabilization capabilities. Its five-axis robotic arm can be configured to pick and place wafers or handling heavy components, allowing automated test sequences to be completed quickly and accurately. Additionally, the unit supports automated measurement of high volumes of data with full traceability and process control. KLA Therma-Probe 300 is equipped with an optimized optical machine with a 50mm objective lens to provide superior image resolution and contrast. Its high-resolution CCD camera offers a 4-6mm visual field and up to 1 nm resolution. The tool also supports fractography and micro-metrology, with a 5.0 μm spot size and 5nm accuracy. The asset can also operate in a non-contact mode, using either thermal imaging or a combination of thermography and photodiode imaging. This provides high-speed measurements with thermal resolution down to just 1mK. Additionally, the model features automated metrology functions, such as PCD and CD-SEM, optical CD, line Edge roughness (LER) measurements, CD and CD-SEM overlay measurements, and back-to-back CD. Overall, TENCOR Therma-Probe 300 is an excellent choice for a variety of applications. It offers superior accuracy and precision, fast data collection, and comprehensive metrology capabilities, making it ideal for research and development, advanced lithography, and semiconductor fabrication.
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