Used RUDOLPH MetaPulse 200X-Cu #293665001 for sale

RUDOLPH MetaPulse 200X-Cu is a high-precision, non-destructive wafer testing and metrology equipment suitable for commercial semiconductor device production. It has excellent accuracy for large wafer sizes, with a large field of view and a high resolution image sensor with a dynamic range of up to 16 bits. In addition, it is capable of measuring electrical parameters that characterize the device performance, such as mobility, like sheet resistance and contact resistance. The system includes a 1000mm wide image scroll, two light sources, precise linear stage control, and a complex optics unit. It is made of top-quality steel for durability and temperature stabilisation, allowing for reliable data collection even in varying and challenging measurement environments. The high-precision optical imaging capability of RUDOLPH METAPULSE 200XCU is designed for creating electrical characterisation model based on device layout. This capability enables non-destructive microscopic inspection, such as characterizing micro-voids in semiconductor device structures, calculating the oxide thickness, and assessing anisotropic effects of a device. The imaging quality allows for high-resolution inspection of different device structures and analysis for process control and yield improvement. The data collection capabilities of METAPULSE 200X CU can be configured to measure parameters, such as wafer map, capacitor, contact/via, and flat prediction/trend. It is designed with an integrated indexing machine, which enables repeatability and maintains data accuracy during long consecutive measurement sessions. Additionally, for characterizing dynamic device performance, METAPULSE 200 X CU can collect data with frequency tuning and characterize the device profile for a range of AC/DC bias excitations from 0Hz up to 10MHz. For data accuracy, the tool also supports simultaneous measurement with many electrical probes to capture parasitics effects, such as contact resistance. It is also designed to reduce measurement noise and data errors from contact bouncing with faster settling times. RUDOLPH METAPULSE 200 X CU is also easily upgradeable and offers high data throughput for efficient production tracking. The intuitive user interface offers easy configuration of complex measurement setups and automated measurement, and the collected data can be easily visualized for analysis. Overall, with its high accuracy and data evaluation capabilities, METAPULSE 200XCU is a great choice for commercial semiconductor device production.