Used RUDOLPH MetaPulse 200X-Cu #9234035 for sale

ID: 9234035
Wafer Size: 8"
Vintage: 2001
Thin film thickness metrology system, 8" Does not include laser 2001 vintage.
RUDOLPH MetaPulse 200X-Cu is a powerful wafer testing and metrology equipment designed to provide the highest precision multi-site capability for fast and accurate device measurements. This state of the art system features an advanced optical unit, high stability of measurement, and superior accuracy. The advanced optical machine employs a patented combination of diffraction gratings and patent-pending proprietary technology to ensure that light, x-rays, ultraviolet (UV) radiation, and thermal imaging systems are able to detect and measure details within the sample, down to the micro and nano scale. The tool is also capable of measuring spectral effects of devices such as surface roughness, edge roughness, topography, and diffusion. RUDOLPH METAPULSE 200XCU offers superior stability of measurement for users, with a highly accurate laser interferometer-based metrology asset, based on a patented combination of capacitive and laser technology. This improves accuracy of measurements and minimizes measurement drift over time. METAPULSE 200X CU also provides fast data acquisition thanks to the high speed pulse receiver and powerful onboard data processing. This ensures faster data analysis and improved time-to-market for devices. The model is able to capture parameters such as reflectance, transmittance, and resistivity with 80 times greater resolution than earlier generations. RUDOLPH METAPULSE 200X CU is designed to support a wide range of wafer sizes, from 200mm (6.25 inches) up to 450mm (17 inches). The equipment is also suitable for a variety of industrial applications, including semiconductor, flat panel display, LED, medical device, and flat-panel display technologies. Overall, RUDOLPH METAPULSE 200 X CU is a powerful, comprehensive wafer testing and metrology system that provides precise multi-site measurements with superior accuracy and stability. With a patented diffraction optics unit, fast data acquisition, and an advanced laser interferometer-based metrology machine, this tool offers the highest level of precision and versatility for industrial uses.
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